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Study on Analysis and Fabrication Conditions of Horizontal SiO2 Slot Waveguides Using Nb2O5

Yoshiki HAYAMA, Katsumi NAKATSUHARA, Shinta UCHIBORI, Takeshi NISHIZAWA

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Summary :

Horizontal slot waveguides enable light to be strongly confined in thin regions. The strong confinement of light in the slot region offers the advantages of enhancing the interaction of light with matter and providing highly sensitive sensing devices. We theoretically investigated fundamental characteristics of horizontal slot waveguides using Nb2O5. The coupling coefficient between SiO2 slot and air slot waveguides was calculated. Characteristics of bending loss in slot waveguide were also analyzed. The etching conditions in reactive ion etching needed to obtain a sidewall with high verticality were studied. We propose a process for fabricating horizontal slot waveguides using Nb2O5 thin film deposition and selective etching of SiO2. Horizontal slot waveguides were fabricated that had an SiO2 slot of less than 30 nm SiO2. The propagated light passing through the slot waveguides was also obtained.

Publication
IEICE TRANSACTIONS on Electronics Vol.E103-C No.11 pp.669-678
Publication Date
2020/11/01
Publicized
2020/06/05
Online ISSN
1745-1353
DOI
10.1587/transele.2019OCP0007
Type of Manuscript
Special Section PAPER (Special Section on Opto-electronics and Communications for Future Optical Network)
Category

Authors

Yoshiki HAYAMA
  Kanagawa Institute of Technology
Katsumi NAKATSUHARA
  Kanagawa Institute of Technology
Shinta UCHIBORI
  Kanagawa Institute of Technology
Takeshi NISHIZAWA
  Kanagawa Institute of Technology

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