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WSSA: A High Performance Simulated Annealing and Its Application to Transistor Placement

Shunji SAIKA, Masahiro FUKUI, Masahiko TOYONAGA, Toshiro AKINO

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Summary :

Another high performance simulated annealing is proposed which we call widely stepping simulated annealing (WSSA). It flies from a starting high temperature to a finishing low temperature staying at only twenty or so temperatures to approach thermal equilibriums. We survey the phase transition in simulated annealing process and estimate the major cost variation (dEc) at the critical temperature. The WSSA uses a function (H(t)) that represents the probability for a hill-climbing with the dEc of cost increase to be accepted in Metropolis' Monte Carlo simulation at temperature t. We have applied the first version of WSSA to one dimensional transistor placement optimizations for several industrial standard cells, and compared its performance with simulated annealing with a geometrically scheduled cooling. The solutions by the WSSA are as good as, and sometimes much better than, the solutions by the simulated annealing, while the time consumption by the WSSA is properly under one 30th of that by the simulated annealing.

Publication
IEICE TRANSACTIONS on Fundamentals Vol.E83-A No.12 pp.2584-2591
Publication Date
2000/12/25
Publicized
Online ISSN
DOI
Type of Manuscript
Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
Category
Layout Synthesis

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