1-1hit |
Woo Young CHOI Min Su HAN Boram HAN Dongsun SEO Il Hwan CHO
A modified modeling of residue effect on nano-electro-mechanical nonvolatile memory (NEMory) is presented for considering wet etching process. The effect of a residue under the cantilever is investigated for the optimization. The feasibility of the proposed model is investigated by finite element analysis simulations.