The MOS switch with bootstrapped technique is widely used in low-voltage switched-capacitor circuit. The switched-capacitor circuit with the bootstrapped technique could be a dangerous design approach in the nano-scale CMOS process due to the gate-oxide transient overstress. The impact of gate-oxide transient overstress on MOS switch in switched-capacitor circuit is investigated in this work with the sample-and-hold amplifier (SHA) in a 130-nm CMOS process. After overstress on the MOS switch of SHA with unity-gain buffer, the circuit performances in time domain and frequency domain are measured to verify the impact of gate-oxide reliability on circuit performances. The oxide breakdown on switch device degrades the circuit performance of bootstrapped switch technique.

A new sub-1-V CMOS bandgap voltage reference without using low-threshold-voltage device is presented in this paper. The new proposed sub-1-V bandgap reference with startup circuit has been successfully verified in a standard 0.25-µm CMOS process, where the occupied silicon area is only 177 µm106 µm. The experimental results have shown that, with the minimum supply voltage of 0.85 V, the output reference voltage is 238.2 mV at room temperature, and the temperature coefficient is 58.1 ppm/ from -10 to 120 without laser trimming. Under the supply voltage of 0.85 V, the average power supply rejection ratio (PSRR) is -33.2 dB at 10 kHz.