We fabricated mixed-signal ICs (MSICs) using wafer-bonded SOI devices with a film several microns thick. We found the MOSFETs on wafer-bonded SOI had characteristics as good as those on a conventional wafer provided the active Si layer is more than 2 µm thick. We fabricated a 16-bit SOI-CMOS delta-sigma A/D converter that suppressed digital noise interference via the substrate. We also fabricated a rectifier-merged SOI-BiCMOS circuit. The resulting characteristics were good, and not possible using conventional junction isolation. Our results suggest that SOI-based isolation is a key technology in integrating devices and systems on a single chip.