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K.G. RAVIKUMAR Kazuhiko SHIMOMURA Tomoyuki KIKUGAWA Akira IZUMI Katsuaki MATSUBARA Shigehisa ARAI Yasuharu SUEMATSU
An intersectional optical switch structure based on the field induced refractive index variation was fabricated by the use of LPE grown GaInAsP/InP MQW wafer. The first switching operation in a MQW intersectional switch structure was achieved. The field induced refractive index variation in quantum well was estimated to be around 0.45% at the applied field of 13 V/µm from the experimentally obtained switching ratio. Finally a small X-type modulator with low chirp, low power saturation is proposed which make use of the reflection phenomenon caused by field induced rafractive index variation instead of absorption phenomenon as in conventional absorption type modulators.