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[Keyword] string algorithm(3hit)

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  • A Simple Heuristic for Order-Preserving Matching

    Joong Chae NA  Inbok LEE  

     
    LETTER

      Pubricized:
    2018/10/30
      Vol:
    E102-D No:3
      Page(s):
    502-504

    Order preserving matching refers to the problem of reporting substrings in the text which are order-isomorphic to the pattern. In this paper, we show a simple heuristic which runs in linear time on average, based on finding the largest elements in each substring and checking their locations against that of the pattern. It is easy to implement and experimental results showed that the running time grows linearly.

  • A Heuristic for Constructing Smaller Automata Based on Suffix Sorting and Its Application in Network Security

    Inbok LEE  Victor C. VALGENTI  Min S. KIM  Sung-il OH  

     
    LETTER

      Pubricized:
    2017/12/19
      Vol:
    E101-D No:3
      Page(s):
    613-615

    In this paper we show a simple heuristic for constructing smaller automata for a set of regular expressions, based on suffix sorting: finding common prefixes and suffixes in regular expressions and merging them. It is an important problem in network security. We applied our approach to random and real-world regular expressions. Experimental results showed that our approach yields up to 12 times enhancement in throughput.

  • Three-Dimensional Triangle-Based Simulation of Etching Processes and Applications

    Oliver LENHART  Eberhard BAR  

     
    PAPER

      Vol:
    E86-C No:3
      Page(s):
    427-432

    A software module for the three-dimensional simulation of etching processes has been developed. It works on multilayer structures given as triangulated surface meshes. The mesh is moved nodewise according to rates which, in this work, have been determined from isotropic and anisotropic components. An important feature of the algorithm is the automatic detection of triple lines along mask edges and the refinement of triangles at these triple lines. This allows for the simulation of underetching. The capabilities of the algorithm are demonstrated by several examples such as the simulation of glass etching for the fabrication of a phase shift mask for optical lithography and the etching of an STI trench structure. Moreover, etch profiles of a silicon substrate covered by an oxide mask are shown for different parameters of the etch components. Spacer etching has also been performed. Furthermore, a specific algorithm for the simulation of purely isotropic etching is described and demonstrated.