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We applied a roll-to-sheet imprinting process to a large-scale substrate. Patterned ruthenium oxide (RuO2) electrodes were fabricated on both glass and flexible substrates. The resistivity of the electrodes on a glass substrate was 3.5 × 10-5 Ω cm, which indicates that this technique is useful for the fabrication of thin-film transistor (TFT) electrodes.
Hiroaki KOYAMA
Japan Advanced Institute of Science and Technology (JAIST)
Kazuhiro FUKADA
Japan Advanced Institute of Science and Technology (JAIST)
Yoshitaka MURAKAMI
Japan Advanced Institute of Science and Technology (JAIST)
Satoshi INOUE
Japan Advanced Institute of Science and Technology (JAIST)
Tatsuya SHIMODA
Japan Advanced Institute of Science and Technology (JAIST)
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Hiroaki KOYAMA, Kazuhiro FUKADA, Yoshitaka MURAKAMI, Satoshi INOUE, Tatsuya SHIMODA, "Investigation of Roll-to-Sheet Imprinting for the Fabrication of Thin-film Transistor Electrodes" in IEICE TRANSACTIONS on Electronics,
vol. E97-C, no. 11, pp. 1042-1047, November 2014, doi: 10.1587/transele.E97.C.1042.
Abstract: We applied a roll-to-sheet imprinting process to a large-scale substrate. Patterned ruthenium oxide (RuO2) electrodes were fabricated on both glass and flexible substrates. The resistivity of the electrodes on a glass substrate was 3.5 × 10-5 Ω cm, which indicates that this technique is useful for the fabrication of thin-film transistor (TFT) electrodes.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/transele.E97.C.1042/_p
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@ARTICLE{e97-c_11_1042,
author={Hiroaki KOYAMA, Kazuhiro FUKADA, Yoshitaka MURAKAMI, Satoshi INOUE, Tatsuya SHIMODA, },
journal={IEICE TRANSACTIONS on Electronics},
title={Investigation of Roll-to-Sheet Imprinting for the Fabrication of Thin-film Transistor Electrodes},
year={2014},
volume={E97-C},
number={11},
pages={1042-1047},
abstract={We applied a roll-to-sheet imprinting process to a large-scale substrate. Patterned ruthenium oxide (RuO2) electrodes were fabricated on both glass and flexible substrates. The resistivity of the electrodes on a glass substrate was 3.5 × 10-5 Ω cm, which indicates that this technique is useful for the fabrication of thin-film transistor (TFT) electrodes.},
keywords={},
doi={10.1587/transele.E97.C.1042},
ISSN={1745-1353},
month={November},}
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TY - JOUR
TI - Investigation of Roll-to-Sheet Imprinting for the Fabrication of Thin-film Transistor Electrodes
T2 - IEICE TRANSACTIONS on Electronics
SP - 1042
EP - 1047
AU - Hiroaki KOYAMA
AU - Kazuhiro FUKADA
AU - Yoshitaka MURAKAMI
AU - Satoshi INOUE
AU - Tatsuya SHIMODA
PY - 2014
DO - 10.1587/transele.E97.C.1042
JO - IEICE TRANSACTIONS on Electronics
SN - 1745-1353
VL - E97-C
IS - 11
JA - IEICE TRANSACTIONS on Electronics
Y1 - November 2014
AB - We applied a roll-to-sheet imprinting process to a large-scale substrate. Patterned ruthenium oxide (RuO2) electrodes were fabricated on both glass and flexible substrates. The resistivity of the electrodes on a glass substrate was 3.5 × 10-5 Ω cm, which indicates that this technique is useful for the fabrication of thin-film transistor (TFT) electrodes.
ER -