Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing
Summary :
The increase in the time required for data processing, mask drawing, and inspection of photomask, has led to substantial increase in mask manufacturing cost. This has become one of the major challenges in the semiconductor industry. We have developed a data flow process for mask manufacturing in which we refer to design intent information in order to reduce TAT of mask manufacturing processes. We convert design level information "Design Intent (DI)" into priority information of mask manufacturing data known as "Mask Data Rank (MDR)" so that we can identify and sort out the importance of mask patterns from the view point of the design side. As a result, we can reduce mask writing time and mask inspection time. Our objective is to build efficient data flow conversion system from DI to MDR. In this paper we introduce the idea of MDR and the software system that we built for DI extraction. Then we show the experimental results with actual chip data. Lastly we will discuss related issues and their solutions.
- Publication
- IEICE TRANSACTIONS on Fundamentals Vol.E93-A No.12 pp.2424-2432
- Publication Date
- 2010/12/01
- Publicized
- Online ISSN
- 1745-1337
- DOI
- 10.1587/transfun.E93.A.2424
- Type of Manuscript
- Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
- Category
- Device and Circuit Modeling and Analysis
Authors
Keyword
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Kokoro KATO, Masakazu ENDO, Tadao INOUE, Shigetoshi NAKATAKE, Masaki YAMABE, Sunao ISHIHARA, "Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing" in IEICE TRANSACTIONS on Fundamentals,
vol. E93-A, no. 12, pp. 2424-2432, December 2010, doi: 10.1587/transfun.E93.A.2424.
Abstract: The increase in the time required for data processing, mask drawing, and inspection of photomask, has led to substantial increase in mask manufacturing cost. This has become one of the major challenges in the semiconductor industry. We have developed a data flow process for mask manufacturing in which we refer to design intent information in order to reduce TAT of mask manufacturing processes. We convert design level information "Design Intent (DI)" into priority information of mask manufacturing data known as "Mask Data Rank (MDR)" so that we can identify and sort out the importance of mask patterns from the view point of the design side. As a result, we can reduce mask writing time and mask inspection time. Our objective is to build efficient data flow conversion system from DI to MDR. In this paper we introduce the idea of MDR and the software system that we built for DI extraction. Then we show the experimental results with actual chip data. Lastly we will discuss related issues and their solutions.
URL: https://global.ieice.org/en_transactions/fundamentals/10.1587/transfun.E93.A.2424/_p
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@ARTICLE{e93-a_12_2424,
author={Kokoro KATO, Masakazu ENDO, Tadao INOUE, Shigetoshi NAKATAKE, Masaki YAMABE, Sunao ISHIHARA, },
journal={IEICE TRANSACTIONS on Fundamentals},
title={Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing},
year={2010},
volume={E93-A},
number={12},
pages={2424-2432},
abstract={The increase in the time required for data processing, mask drawing, and inspection of photomask, has led to substantial increase in mask manufacturing cost. This has become one of the major challenges in the semiconductor industry. We have developed a data flow process for mask manufacturing in which we refer to design intent information in order to reduce TAT of mask manufacturing processes. We convert design level information "Design Intent (DI)" into priority information of mask manufacturing data known as "Mask Data Rank (MDR)" so that we can identify and sort out the importance of mask patterns from the view point of the design side. As a result, we can reduce mask writing time and mask inspection time. Our objective is to build efficient data flow conversion system from DI to MDR. In this paper we introduce the idea of MDR and the software system that we built for DI extraction. Then we show the experimental results with actual chip data. Lastly we will discuss related issues and their solutions.},
keywords={},
doi={10.1587/transfun.E93.A.2424},
ISSN={1745-1337},
month={December},}
Copy
TY - JOUR
TI - Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing
T2 - IEICE TRANSACTIONS on Fundamentals
SP - 2424
EP - 2432
AU - Kokoro KATO
AU - Masakazu ENDO
AU - Tadao INOUE
AU - Shigetoshi NAKATAKE
AU - Masaki YAMABE
AU - Sunao ISHIHARA
PY - 2010
DO - 10.1587/transfun.E93.A.2424
JO - IEICE TRANSACTIONS on Fundamentals
SN - 1745-1337
VL - E93-A
IS - 12
JA - IEICE TRANSACTIONS on Fundamentals
Y1 - December 2010
AB - The increase in the time required for data processing, mask drawing, and inspection of photomask, has led to substantial increase in mask manufacturing cost. This has become one of the major challenges in the semiconductor industry. We have developed a data flow process for mask manufacturing in which we refer to design intent information in order to reduce TAT of mask manufacturing processes. We convert design level information "Design Intent (DI)" into priority information of mask manufacturing data known as "Mask Data Rank (MDR)" so that we can identify and sort out the importance of mask patterns from the view point of the design side. As a result, we can reduce mask writing time and mask inspection time. Our objective is to build efficient data flow conversion system from DI to MDR. In this paper we introduce the idea of MDR and the software system that we built for DI extraction. Then we show the experimental results with actual chip data. Lastly we will discuss related issues and their solutions.
ER -
English
