Co-containing ferrite thin-film media deposited by a reactive-ECR-sputtering at a low substrate temperature of 150 degree Celsius were oxidized by ECR plasma. The magnetic properties and recording characteristics of the media were improved by the oxidation with maintaining a smooth surface. The media showed high D50 of 203 kFRPI in MIG head recording and reproduction. The Co-containing ferrite thin-film is feasible to be used as a protective overcoat layer.

Employing reactive sputtering using an electron-cyclotron-resonance microwave plasma without oxidation process, high coercivity ferrite thin-films with perpendicular magnetic anisotropy were successfully prepared without NiO underlayer at low substrate temperature. The ferrite thin-film deposited on glass substrate had smooth surface and were composed of small grains. Perpendicular recording was performed on the ferrite thin-film hard disk. The ferrite thin-films with high coercivity could be prepared on flexible film substrates (Polyimide and PET).