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Maiko HATANO Norimasa YAFUNE Hirokuni TOKUDA Yoshiyuki YAMAMOTO Shin HASHIMOTO Katsushi AKITA Masaaki KUZUHARA
This paper describes high-temperature electron transport properties of AlGaN-channel HEMT fabricated on a free-standing AlN substrate, estimated at temperatures between 25 and 300. The AlGaN-channel HEMT exhibited significantly reduced temperature dependence in DC and RF device characteristics, as compared to those for the conventional AlGaN/GaN HEMT, resulting in larger values in both saturated drain current and current gain cutoff frequency at 300. Delay time analyses suggested that the temperature dependence of the AlGaN-channel HEMT was primarily dominated by the effective electron velocity in the AlGaN channel. These results indicate that an AlGaN-channel HEMT fabricated on an AlN substrate is promising for high-performance device applications at high temperatures.