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Keijiro SAKAI Satoshi DOI Nobuyuki IWATA Hirofumi YAJIMA Hiroshi YAMAMOTO
We propose a novel technique to grow the single-walled carbon nanotubes (SWNTs) with specific chirality at the desired position using free electron laser (FEL) irradiation during growth and surface treatment. As a result, only the semiconducting SWNTs grew at the area between triangle electrodes, where the ozone treatment was done to be hydrophilic when an alcohol chemical vapor deposition (ACCVD) process was carried out with the 800 nm FEL irradiation. Although the number of possible chiral index is 22 in the SWNTs grown without the FEL irradiation, the number is much reduced to be 8 by the FEL.
Mikio MOHRI Hiroaki KAKINUMA Taiji TSURUOKA
We have studied in detail the effect of gas flow rates on the film properties of low-temperature (300) polycrystalline silicon (poly-Si) films prepared by conventional plasma enhanced chemical vapor deposition (13.56 MHz) with SiF4/SiH4/H2 gases. The effect of SiH4 flow rate on crystallization is shown to be large. A small amount of SiH4 with high SiF4 and H2 flow rates (50[H2]/[SiH4]1200, 20[SiF4]/[SiH4]150, 1[H2]/[SiF4]16) is important to form poly-Si films. The poly-Si films deposited under such optimized conditions had shown preferential 〈110〉-orientation and the crystalline fraction is estimated to be more than 80%. The deposition rates are in the range of 5-30 nm/min. The conductivity is in the range of 10-8-10-6 S/cm. Further, the electrical conduction indicates an activation type, and the activation energy is in the range of 0.5-0.6 eV.