Thin films of Teflon AF 1600 were prepared by an electron-assisted (e-assist) deposition method. IR analysis revealed that the e-assist deposition generates small amount of polar groups such as carboxylic acid in the molecular structure of the deposited films. The polar groups contributed to increase intermolecular interaction and led to remarkable improvement in the adhesion strength and robustness of the films especially when a bias voltage was applied to the substrate in the course of e-assist deposition. The vapor-deposited Teflon AF films had refractive indices of 1.35 to 1.38, and were effective for antireflection coatings. The use of e-assist deposition slightly increased the refractive index as a trade-off for the improvement of film robustness.

We present an optimization algorithm for the design of multilayer antireflection (AR) coatings for organic photovoltaic (OPV) cells. When a set of available materials for the AR films is given, the proposed method allows for searching the globally optimized AR structure that maximizes the short-circuit current density (JSC) under simulated solar light illumination (AM 1.5). By applying this method to an OPV solar cell with a configuration of Al/P3HT:PCBM/MoO3/ITO, we demonstrated that JSC can increase by 7.5% with a 6-layer AR coating, consisting of MgF2, ZnS, and Al2O3. A notable feature of this method is that it can find not only the optimal solution, which maximizes JSC , but also the quasi-optimal solutions, which increase JSC to nearly maximum levels. We showed that the quasi-optimal solution may have higher robustness against deviations in film thicknesses, from their designated values. This method indicates the importance of practically useful, non-optimal solutions for designing AR coatings. The present method allows for extending the user's choices and facilitates the realization of a practical design for an AR coating.

Fluoropolymer thin films were prepared by the ion-assisted vapor deposition polymerization (IAD) of 2-(perfluorohexyl)ethylacrylate (Rf-6). The adhesion strength of the film to substrates was estimated by sonicating the films in water and by immersing the films into dichloro-pentafluoro propane (HCFC225). The Rf-6 polymer films by IAD showed stronger adhesion to glass compared to a spin-coated Teflon AF film. The adhesion strength was improved with increasing ion energy Eion of IAD. The IAD films showed superior adhesion to PET surface compared to the glass substrate. The Rf-6 polymer film was effective as a single-layer antireflective coating. The refractive index of the film was 1.368 (λ = 546 nm), which increased slightly with increasing Eion. IAD can be a promising method to prepare fluoropolymer thin films due to the solvent-less process and the flexibility in controlling the film characteristics by the ion energy.