IEICE TRANSACTIONS on Electronics
Vapor Deposition of Fluoropolymer Thin Films for Antireflection Coating
Summary :
Thin films of Teflon AF 1600 were prepared by an electron-assisted (e-assist) deposition method. IR analysis revealed that the e-assist deposition generates small amount of polar groups such as carboxylic acid in the molecular structure of the deposited films. The polar groups contributed to increase intermolecular interaction and led to remarkable improvement in the adhesion strength and robustness of the films especially when a bias voltage was applied to the substrate in the course of e-assist deposition. The vapor-deposited Teflon AF films had refractive indices of 1.35 to 1.38, and were effective for antireflection coatings. The use of e-assist deposition slightly increased the refractive index as a trade-off for the improvement of film robustness.
- Publication
- IEICE TRANSACTIONS on Electronics Vol.E106-C No.6 pp.195-201
- Publication Date
- 2023/06/01
- Publicized
- 2022/10/26
- Online ISSN
- 1745-1353
- DOI
- 10.1587/transele.2022OMP0006
- Type of Manuscript
- Special Section PAPER (Special Section on Recent Progress in Organic Molecular Electronics)
- Category
Authors
Soma YASUI
Tokyo University of Agriculture and Technology
Fujio OHISHI
Kanagawa University
Hiroaki USUI
Tokyo University of Agriculture and Technology
Keyword
Latest Issue
Copyrights notice of machine-translated contents
The copyright of the original papers published on this site belongs to IEICE. Unauthorized use of the original or translated papers is prohibited. See IEICE Provisions on Copyright for details.
Cite this
Copy
Soma YASUI, Fujio OHISHI, Hiroaki USUI, "Vapor Deposition of Fluoropolymer Thin Films for Antireflection Coating" in IEICE TRANSACTIONS on Electronics,
vol. E106-C, no. 6, pp. 195-201, June 2023, doi: 10.1587/transele.2022OMP0006.
Abstract: Thin films of Teflon AF 1600 were prepared by an electron-assisted (e-assist) deposition method. IR analysis revealed that the e-assist deposition generates small amount of polar groups such as carboxylic acid in the molecular structure of the deposited films. The polar groups contributed to increase intermolecular interaction and led to remarkable improvement in the adhesion strength and robustness of the films especially when a bias voltage was applied to the substrate in the course of e-assist deposition. The vapor-deposited Teflon AF films had refractive indices of 1.35 to 1.38, and were effective for antireflection coatings. The use of e-assist deposition slightly increased the refractive index as a trade-off for the improvement of film robustness.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/transele.2022OMP0006/_p
Copy
@ARTICLE{e106-c_6_195,
author={Soma YASUI, Fujio OHISHI, Hiroaki USUI, },
journal={IEICE TRANSACTIONS on Electronics},
title={Vapor Deposition of Fluoropolymer Thin Films for Antireflection Coating},
year={2023},
volume={E106-C},
number={6},
pages={195-201},
abstract={Thin films of Teflon AF 1600 were prepared by an electron-assisted (e-assist) deposition method. IR analysis revealed that the e-assist deposition generates small amount of polar groups such as carboxylic acid in the molecular structure of the deposited films. The polar groups contributed to increase intermolecular interaction and led to remarkable improvement in the adhesion strength and robustness of the films especially when a bias voltage was applied to the substrate in the course of e-assist deposition. The vapor-deposited Teflon AF films had refractive indices of 1.35 to 1.38, and were effective for antireflection coatings. The use of e-assist deposition slightly increased the refractive index as a trade-off for the improvement of film robustness.},
keywords={},
doi={10.1587/transele.2022OMP0006},
ISSN={1745-1353},
month={June},}
Copy
TY - JOUR
TI - Vapor Deposition of Fluoropolymer Thin Films for Antireflection Coating
T2 - IEICE TRANSACTIONS on Electronics
SP - 195
EP - 201
AU - Soma YASUI
AU - Fujio OHISHI
AU - Hiroaki USUI
PY - 2023
DO - 10.1587/transele.2022OMP0006
JO - IEICE TRANSACTIONS on Electronics
SN - 1745-1353
VL - E106-C
IS - 6
JA - IEICE TRANSACTIONS on Electronics
Y1 - June 2023
AB - Thin films of Teflon AF 1600 were prepared by an electron-assisted (e-assist) deposition method. IR analysis revealed that the e-assist deposition generates small amount of polar groups such as carboxylic acid in the molecular structure of the deposited films. The polar groups contributed to increase intermolecular interaction and led to remarkable improvement in the adhesion strength and robustness of the films especially when a bias voltage was applied to the substrate in the course of e-assist deposition. The vapor-deposited Teflon AF films had refractive indices of 1.35 to 1.38, and were effective for antireflection coatings. The use of e-assist deposition slightly increased the refractive index as a trade-off for the improvement of film robustness.
ER -
English
