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Soma YASUI Fujio OHISHI Hiroaki USUI
Thin films of Teflon AF 1600 were prepared by an electron-assisted (e-assist) deposition method. IR analysis revealed that the e-assist deposition generates small amount of polar groups such as carboxylic acid in the molecular structure of the deposited films. The polar groups contributed to increase intermolecular interaction and led to remarkable improvement in the adhesion strength and robustness of the films especially when a bias voltage was applied to the substrate in the course of e-assist deposition. The vapor-deposited Teflon AF films had refractive indices of 1.35 to 1.38, and were effective for antireflection coatings. The use of e-assist deposition slightly increased the refractive index as a trade-off for the improvement of film robustness.
Kazuo SENDA Tsuyoshi MATSUDA Kuniaki TANAKA Hiroaki USUI
Fluoropolymer thin films were prepared by the ion-assisted vapor deposition polymerization (IAD) of 2-(perfluorohexyl)ethylacrylate (Rf-6). The adhesion strength of the film to substrates was estimated by sonicating the films in water and by immersing the films into dichloro-pentafluoro propane (HCFC225). The Rf-6 polymer films by IAD showed stronger adhesion to glass compared to a spin-coated Teflon AF film. The adhesion strength was improved with increasing ion energy Eion of IAD. The IAD films showed superior adhesion to PET surface compared to the glass substrate. The Rf-6 polymer film was effective as a single-layer antireflective coating. The refractive index of the film was 1.368 (λ = 546 nm), which increased slightly with increasing Eion. IAD can be a promising method to prepare fluoropolymer thin films due to the solvent-less process and the flexibility in controlling the film characteristics by the ion energy.