Thin films of Teflon AF 1600 were prepared by an electron-assisted (e-assist) deposition method. IR analysis revealed that the e-assist deposition generates small amount of polar groups such as carboxylic acid in the molecular structure of the deposited films. The polar groups contributed to increase intermolecular interaction and led to remarkable improvement in the adhesion strength and robustness of the films especially when a bias voltage was applied to the substrate in the course of e-assist deposition. The vapor-deposited Teflon AF films had refractive indices of 1.35 to 1.38, and were effective for antireflection coatings. The use of e-assist deposition slightly increased the refractive index as a trade-off for the improvement of film robustness.

Polyimide thin films were prepared by vapor-deposition polymerization. Naphthalene carboxylic dianhydride (NTCDA) was coevaporated with either diamino naphthalene (DAN) or diamino benzophenone (DAB). Coevaporation of dianhydride and diamines yielded thin films of polyamic acids. A polyimide thin film was obtained by annealing the codeposited film of NTCDA-DAB. On the other hand, the codeposited film of NTCDA-DAN was not imidized by annealing. In both cases, chemical structures of the products were not largely influenced by the molar ratio of depositing monomers if sufficient amount of diamine molecules are supplied in the coevaporation process.