18.188.154.252
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Tatsuya ISHIKAWA Heisuke SAKAI Hideyuki MURATA
We have developed the flexible dual-gate OFET based pressure sensor using a thin polyethylene naphthalate (PEN, 25 µm) film as a substrate. The performance was equivalent to that fabricated on the glass substrate, and it could also be used on the curved surface. Drain current in the flexible pressure sensor was increased according to the pressure load without application of gate voltage. The magnitude of the change in drain current with respect to pressure application was about 2.5 times larger than that for the device on the glass substrate.
In this paper, a 60 nm-thick ferroelectric film of poly(vinylidene fluoride–trifluoroethylene) on a flexible substrate of aluminum foil was fabricated and characterized. Compared to pristine silicon wafer, Al-foil has very large root-mean-square (RMS) roughness, thus presenting challenges for the fabrication of flat and uniform electronic devices on such a rough substrate. In particular, RMS roughness affects the leakage current of dielectrics, the uniformity of devices, and the switching time in ferroelectrics. To avoid these kinds of problems, a new thin film fabrication method adopting a detach-and-transfer technique has been developed. Here, 'detach' means that the ferroelectric film is detached from a flat substrate (sacrificial substrate), and 'transfer' refers to the process of the detached film being moved onto the rough substrate (main substrate). To characterize the dielectric property of the transferred film, polarization and voltage relationships were measured, and the results showed that a hysteresis loop could be obtained with low leakage current.