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Kiyoshi ISHII Yoshifumi SAITOU Kengo FURUTANI Hiroshi SAKUMA Yoshito IKEDA
Tin-doped indium oxide (ITO) thin films were prepared on a polyethylene terephthalate (PET) foil by bias sputtering. In the absence of a substrate bias, films having a high resistivity of 210-2 Ωcm were formed. On the other hand, by the application of an rf substrate bias, films having a low resistivity of 2.610-4 Ωcm were formed. The energy of ions that bombarded the substrate during bias sputtering was estimated by a simulation of the ion acceleration. The optimum ion-energy required for the reduction of resistivity was found to be approximately 50 eV.
Kiyoshi ISHII Kazunari KUROKAWA Sachio YOSHIHARA
Photocatalytic TiO2 films were prepared by reactive gas flow sputtering (GFS), which enables sputter-deposition at a high pressure of about 100 Pa. A pure Ti tube was used as the target, and the O2 gas was supplied in front of the substrate, resulting in a very stable discharge and a high deposition rate of 80 nm/min. The crystal structure and morphology of TiO2 films were found to strongly depend on the flow rate of O2 gas during sputtering. Polycrystalline films composed of rutile and anatase crystallites were deposited at a low O2 flow rate of less than 2 sccm when Ar flow rate was set at 300 sccm, and amorphous films were deposited at higher O2 flow rates. Polycrystalline films composed of very small crystallites showed high levels of photocatalytic activity, while amorphous films showed no activity.