Accuracy of a method for analyzing the interface defect properties; time-domain charge pumping method, is evaluated. The method monitors the charge pumping (CP) current in time domain, and thus we expect that it gives us a noble way to investigate the interface state properties. In this study, for the purpose of evaluating the accuracy of the method, the interface state density extracted from the time-domain data is compared with that measured using the conventional CP method. The results show that they are equal to each other for all measured devices with various defect densities, demonstrating that the time-domain CP method is sufficiently accurate for the defect density evaluation.

We performed the (NH4)2S surface treatments before Al2O3 deposition to improve the Al2O3/III-Nitride interface quality in Al2O3/AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors (MOSHFETs). Interface state density at the Al2O3/GaN interface was decreased by the (NH4)2S treatment. The hysteresis width in ID-VGS and gm-VGS characteristics of the Al2O3/AlGaN MOSHFETs with the (NH4)2S treatment was smaller than that without the (NH4)2S treatment. In addition, transconductance (gm) decrease at a large gate voltage was relaxed by the (NH4)2S treatment. We also performed ultraviolet (UV) illumination during the (NH4)2S treatment for further improvement of the Al2O3/III-Nitride interface quality. Interface state density of the Al2O3/GaN MOS diodes with the UV illumination was smaller than that without the UV illumination.