Transparent organic light-emitting diodes (TOLEDs) were investigated with top electrode of indium-tin-oxide (ITO) by ion-plating method. High deposition rate of 4.4 nm/s was realized without plasma damage of under organic layer. In the TOLEDs with inverted structure, high transmittance of over 75% at 550 nm and bright emission of 1,850 and 1,410 cd/m2, from bottom and top side at 163 mA/cm2, respectively, were obtained.

Indium tin oxide (ITO) films were deposited at a temperature below 50 by a low-voltage sputtering system. The sputtering voltage was fixed at 100 V and Ar, Kr, and Xe were used as the sputtering gases. Compared with the sputtering in Ar gas, the sputtering in Kr or Xe gas caused a significant suppression of crystallization of the deposited film and resulted in the formation of amorphous films. These films had much lower resistivities than the films deposited using Ar gas, since the Hall mobility of the films had a larger value. Typical Hall mobility and carrier density are 50 cm2/Vsec, and 51020 cm-3, respectively. This improvement was attributable to the reduction of high-energy particle bombardment to the film surface in the sputtering. These films are stable at a temperature below 150, and crystallization occurs at a temperature above 150.