For analog applications, the Metal-Insulator-Metal (MIM) capacitance has to be measured at a much higher resolution than using the conventional methods, i.e. to a sub-femto level. A new robust mismatch measurement technique is proposed, which is more accurate and robust compared to the conventional Floating Gate Capacitance Measurement (FGCM) methods. A capacitance mismatching measurement methodology based on Vs is more stable than that based on Vf because the influence of pre-existing charge in the floating-gate can be cancelled in the slope of ΔVs/ΔVf based on Vs. The accuracy of this method is evaluated through silicon measurement in a 0.13 µm technology. It shows that, compared to the ideal value, the average of the new method are within 0.12% compared to 49.23% in conventional method while the standard deviation is within 0.15%.