Reactive sputtering of a metallic target in DC planar magnetron discharge shows a drastic mode transition between metallic and oxide modes. To describe the experimental results quantitatively, a new reactive sputtering model including the secondary electron emission coefficient of a target has been developed. The model is based on a simple reactive gas balance model proposed by Berg et al., and can quantitatively describe experimental results such as the oxygen flow rate dependence of deposition rate and discharge, observed for MgO sputter-deposition.

The relationships between lattice orientation of the electron-beam evaporated MgO layer used as protecting layer for ac plasma displays (ac-PDPs) and the discharge characteristics of color ac-PDPs were investigated by the measurements of ion-induced secondary electron emission. It is proved that values of γi for MgO are large in the order of (220) orientation, (200) orientation, and (111) orientation, that is, γi(220) > γi(200) > γi(111). The values of φ for different lattice orientation are obtained by the measurements of thermionic emission and photo emission. The aging measurements for testing panels with the different lattice orientation of MgO layer revealed that performance of those panels are excellent in the order of (220), (200), and (111). In particular, luminance and luminous efficiency become larger in the order of (220), (200), and (111). It is pointed out that the degree of longevity, sustaining voltage, and memory margin for ac-PDPs with protecting materials as MgO are estimated by the measurements of γi.