New Reactive Sputtering Model Considering the Effect of the Electron Emission Coefficiency for MgO Deposition
Summary :
Reactive sputtering of a metallic target in DC planar magnetron discharge shows a drastic mode transition between metallic and oxide modes. To describe the experimental results quantitatively, a new reactive sputtering model including the secondary electron emission coefficient of a target has been developed. The model is based on a simple reactive gas balance model proposed by Berg et al., and can quantitatively describe experimental results such as the oxygen flow rate dependence of deposition rate and discharge, observed for MgO sputter-deposition.
- Publication
- IEICE TRANSACTIONS on Electronics Vol.E84-C No.11 pp.1667-1672
- Publication Date
- 2001/11/01
- Publicized
- Online ISSN
- DOI
- Type of Manuscript
- Special Section PAPER (Special Issue on Electronic Displays)
- Category
- Plasma Displays
Authors
Keyword
Latest Issue
Copyrights notice of machine-translated contents
The copyright of the original papers published on this site belongs to IEICE. Unauthorized use of the original or translated papers is prohibited. See IEICE Provisions on Copyright for details.
Cite this
Copy
Yoshinobu MATSUDA, Kei TASHIRO, Koji OTOMO, Hiroshi FUJIYAMA, "New Reactive Sputtering Model Considering the Effect of the Electron Emission Coefficiency for MgO Deposition" in IEICE TRANSACTIONS on Electronics,
vol. E84-C, no. 11, pp. 1667-1672, November 2001, doi: .
Abstract: Reactive sputtering of a metallic target in DC planar magnetron discharge shows a drastic mode transition between metallic and oxide modes. To describe the experimental results quantitatively, a new reactive sputtering model including the secondary electron emission coefficient of a target has been developed. The model is based on a simple reactive gas balance model proposed by Berg et al., and can quantitatively describe experimental results such as the oxygen flow rate dependence of deposition rate and discharge, observed for MgO sputter-deposition.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e84-c_11_1667/_p
Copy
@ARTICLE{e84-c_11_1667,
author={Yoshinobu MATSUDA, Kei TASHIRO, Koji OTOMO, Hiroshi FUJIYAMA, },
journal={IEICE TRANSACTIONS on Electronics},
title={New Reactive Sputtering Model Considering the Effect of the Electron Emission Coefficiency for MgO Deposition},
year={2001},
volume={E84-C},
number={11},
pages={1667-1672},
abstract={Reactive sputtering of a metallic target in DC planar magnetron discharge shows a drastic mode transition between metallic and oxide modes. To describe the experimental results quantitatively, a new reactive sputtering model including the secondary electron emission coefficient of a target has been developed. The model is based on a simple reactive gas balance model proposed by Berg et al., and can quantitatively describe experimental results such as the oxygen flow rate dependence of deposition rate and discharge, observed for MgO sputter-deposition.},
keywords={},
doi={},
ISSN={},
month={November},}
Copy
TY - JOUR
TI - New Reactive Sputtering Model Considering the Effect of the Electron Emission Coefficiency for MgO Deposition
T2 - IEICE TRANSACTIONS on Electronics
SP - 1667
EP - 1672
AU - Yoshinobu MATSUDA
AU - Kei TASHIRO
AU - Koji OTOMO
AU - Hiroshi FUJIYAMA
PY - 2001
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E84-C
IS - 11
JA - IEICE TRANSACTIONS on Electronics
Y1 - November 2001
AB - Reactive sputtering of a metallic target in DC planar magnetron discharge shows a drastic mode transition between metallic and oxide modes. To describe the experimental results quantitatively, a new reactive sputtering model including the secondary electron emission coefficient of a target has been developed. The model is based on a simple reactive gas balance model proposed by Berg et al., and can quantitatively describe experimental results such as the oxygen flow rate dependence of deposition rate and discharge, observed for MgO sputter-deposition.
ER -
English
