We demonstrated a vertically coupled microring resonator (VCMRR) filter as an Add/Drop wavelength filter. However, the accuracy of center wavelength was not sufficiently high for dense wavelength division multiplexing (DWDM) systems. Thus, a UV trimming technique using a SiN (n=2.01 at λ=1.55 µm) ring core was previously developed. Although a wide center wavelength trimming range of -12.1 nm and the long-term stability of center wavelength were realized, the core size required for single-mode propagation was too small for fabrication using a photolithography process. Therefore in this study, we introduced SiON as the microring core to relax the single-mode condition of core size. We discovered a large UV sensitivity of SiON film formed by a PECVD method, and a wide range UV trimming of microring resonator of -10.5 nm was demonstrated using this phenomenon.
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Satoshi UENO, Toshiki NAGANAWA, Yasuo KOKUBUN, "High UV Sensitivity of SiON Film and Its Application to Center Wavelength Trimming of Microring Resonator Filter" in IEICE TRANSACTIONS on Electronics,
vol. E88-C, no. 5, pp. 998-1004, May 2005, doi: 10.1093/ietele/e88-c.5.998.
Abstract: We demonstrated a vertically coupled microring resonator (VCMRR) filter as an Add/Drop wavelength filter. However, the accuracy of center wavelength was not sufficiently high for dense wavelength division multiplexing (DWDM) systems. Thus, a UV trimming technique using a SiN (n=2.01 at λ=1.55 µm) ring core was previously developed. Although a wide center wavelength trimming range of -12.1 nm and the long-term stability of center wavelength were realized, the core size required for single-mode propagation was too small for fabrication using a photolithography process. Therefore in this study, we introduced SiON as the microring core to relax the single-mode condition of core size. We discovered a large UV sensitivity of SiON film formed by a PECVD method, and a wide range UV trimming of microring resonator of -10.5 nm was demonstrated using this phenomenon.
URL: https://global.ieice.org/en_transactions/electronics/10.1093/ietele/e88-c.5.998/_p
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@ARTICLE{e88-c_5_998,
author={Satoshi UENO, Toshiki NAGANAWA, Yasuo KOKUBUN, },
journal={IEICE TRANSACTIONS on Electronics},
title={High UV Sensitivity of SiON Film and Its Application to Center Wavelength Trimming of Microring Resonator Filter},
year={2005},
volume={E88-C},
number={5},
pages={998-1004},
abstract={We demonstrated a vertically coupled microring resonator (VCMRR) filter as an Add/Drop wavelength filter. However, the accuracy of center wavelength was not sufficiently high for dense wavelength division multiplexing (DWDM) systems. Thus, a UV trimming technique using a SiN (n=2.01 at λ=1.55 µm) ring core was previously developed. Although a wide center wavelength trimming range of -12.1 nm and the long-term stability of center wavelength were realized, the core size required for single-mode propagation was too small for fabrication using a photolithography process. Therefore in this study, we introduced SiON as the microring core to relax the single-mode condition of core size. We discovered a large UV sensitivity of SiON film formed by a PECVD method, and a wide range UV trimming of microring resonator of -10.5 nm was demonstrated using this phenomenon.},
keywords={},
doi={10.1093/ietele/e88-c.5.998},
ISSN={},
month={May},}
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TY - JOUR
TI - High UV Sensitivity of SiON Film and Its Application to Center Wavelength Trimming of Microring Resonator Filter
T2 - IEICE TRANSACTIONS on Electronics
SP - 998
EP - 1004
AU - Satoshi UENO
AU - Toshiki NAGANAWA
AU - Yasuo KOKUBUN
PY - 2005
DO - 10.1093/ietele/e88-c.5.998
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E88-C
IS - 5
JA - IEICE TRANSACTIONS on Electronics
Y1 - May 2005
AB - We demonstrated a vertically coupled microring resonator (VCMRR) filter as an Add/Drop wavelength filter. However, the accuracy of center wavelength was not sufficiently high for dense wavelength division multiplexing (DWDM) systems. Thus, a UV trimming technique using a SiN (n=2.01 at λ=1.55 µm) ring core was previously developed. Although a wide center wavelength trimming range of -12.1 nm and the long-term stability of center wavelength were realized, the core size required for single-mode propagation was too small for fabrication using a photolithography process. Therefore in this study, we introduced SiON as the microring core to relax the single-mode condition of core size. We discovered a large UV sensitivity of SiON film formed by a PECVD method, and a wide range UV trimming of microring resonator of -10.5 nm was demonstrated using this phenomenon.
ER -