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IEICE TRANSACTIONS on Electronics

Process Simulation for Laser Recrystallization

Bo HU, Albert SEIDL, Gertraud NEUMAYER, Reinhold BUCHNER, Karl HABERGER

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Summary :

Modeling and numerical simulation of crystal growth of Si film and heat transport in 3D structure were made for optimization of physical and geometrical parameters used during laser recrystallization. Based on simulations a new concept called micro-absorber was introduced for obtaining defect-free Si films.

Publication
IEICE TRANSACTIONS on Electronics Vol.E75-C No.2 pp.138-144
Publication Date
1992/02/25
Publicized
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DOI
Type of Manuscript
Special Section PAPER (Special Issue on Selected Papers from '91 VPAD)
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