IEICE TRANSACTIONS on Electronics
Fabrication of YBa2Cu3O7
x-PrBa2Cu3O7y Hetero-Structure by Using a Hollow Cathode Discharge Sputtering System
Summary :
A sputtering system using dc hollow cathode discharge was developed for the propose of high Tc superconducting devices. Using this system, as-grown superconducting thin films of YBCO have been formed on MgO and SrTiO3 substrates. Influence of the sputtering conditions such as the substrate temperature and discharge gas pressure on the Tc and lattice parameter was investigated. It was found that superconducting films on MgO with Tc・zero higher than 87 K ere routinely obtained at the pressure of 820 mTorr (5%O2) and substrate temperature of 700
- Publication
- IEICE TRANSACTIONS on Electronics Vol.E76-C No.8 pp.1236-1240
- Publication Date
- 1993/08/25
- Publicized
- Online ISSN
- DOI
- Type of Manuscript
- Special Section PAPER (Special Issue on High-Temperature Superconducting Electronics)
- Category
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Akio KAWABATA, Tadayuki KOBAYASHI, Kouichi USAMI, Toshinari GOTO, "Fabrication of YBa2Cu3O7x-PrBa2Cu3O7y Hetero-Structure by Using a Hollow Cathode Discharge Sputtering System" in IEICE TRANSACTIONS on Electronics,
vol. E76-C, no. 8, pp. 1236-1240, August 1993, doi: .
Abstract: A sputtering system using dc hollow cathode discharge was developed for the propose of high Tc superconducting devices. Using this system, as-grown superconducting thin films of YBCO have been formed on MgO and SrTiO3 substrates. Influence of the sputtering conditions such as the substrate temperature and discharge gas pressure on the Tc and lattice parameter was investigated. It was found that superconducting films on MgO with Tc・zero higher than 87 K ere routinely obtained at the pressure of 820 mTorr (5%O2) and substrate temperature of 700
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e76-c_8_1236/_p
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@ARTICLE{e76-c_8_1236,
author={Akio KAWABATA, Tadayuki KOBAYASHI, Kouichi USAMI, Toshinari GOTO, },
journal={IEICE TRANSACTIONS on Electronics},
title={Fabrication of YBa2Cu3O7x-PrBa2Cu3O7y Hetero-Structure by Using a Hollow Cathode Discharge Sputtering System},
year={1993},
volume={E76-C},
number={8},
pages={1236-1240},
abstract={A sputtering system using dc hollow cathode discharge was developed for the propose of high Tc superconducting devices. Using this system, as-grown superconducting thin films of YBCO have been formed on MgO and SrTiO3 substrates. Influence of the sputtering conditions such as the substrate temperature and discharge gas pressure on the Tc and lattice parameter was investigated. It was found that superconducting films on MgO with Tc・zero higher than 87 K ere routinely obtained at the pressure of 820 mTorr (5%O2) and substrate temperature of 700
keywords={},
doi={},
ISSN={},
month={August},}
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TY - JOUR
TI - Fabrication of YBa2Cu3O7x-PrBa2Cu3O7y Hetero-Structure by Using a Hollow Cathode Discharge Sputtering System
T2 - IEICE TRANSACTIONS on Electronics
SP - 1236
EP - 1240
AU - Akio KAWABATA
AU - Tadayuki KOBAYASHI
AU - Kouichi USAMI
AU - Toshinari GOTO
PY - 1993
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E76-C
IS - 8
JA - IEICE TRANSACTIONS on Electronics
Y1 - August 1993
AB - A sputtering system using dc hollow cathode discharge was developed for the propose of high Tc superconducting devices. Using this system, as-grown superconducting thin films of YBCO have been formed on MgO and SrTiO3 substrates. Influence of the sputtering conditions such as the substrate temperature and discharge gas pressure on the Tc and lattice parameter was investigated. It was found that superconducting films on MgO with Tc・zero higher than 87 K ere routinely obtained at the pressure of 820 mTorr (5%O2) and substrate temperature of 700
ER -
English
