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A non-Local Formulation of Impact Ionization for Silicon

Paul G. SCROBOHACI, Ting-wei TANG

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Summary :

Impact ionization () in two n+-n--n+ device structures is investigated. Data obtained from self-consistent Monte-Carlo (SCMC) simulations of the devices is used to show that the average energy () of only those high energy electrons contributing to is an appropriate variable for the modeling of . A transport model allowing one to calculate is derived from the Boltzmann transport equation (BTE) and calibrated by the SCMC simulation results. The values of and the coefficient, αii, predicted by the proposed model are in good agreement with the Monte-Carlo data.

Publication
IEICE TRANSACTIONS on Electronics Vol.E77-C No.2 pp.134-138
Publication Date
1994/02/25
Publicized
Online ISSN
DOI
Type of Manuscript
Special Section PAPER (Special Issue on 1993 VLSI Process and Device Modeling Workshop (VPAD 93))
Category
Device Modeling

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