FDM/WDM Couplers Using Silica Waveguide Deposited by APCVD

Tadahiko HANADA; Tuyoshi SHIMODA; Mitsuhiro KITAMURA; Sinichi NAKAMURA

FDM/WDM Couplers Using Silica Waveguide Deposited by APCVD

Tadahiko HANADA, Tuyoshi SHIMODA, Mitsuhiro KITAMURA, Sinichi NAKAMURA

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We describe the design, fabrication, and characteristics of FDM/WDM coupler deposited by TEOS-O₃ based APCVD method on silicon substrates. Due to drastically reduced birefringence by APCVD process, completely polarization independent narrow band (100 GHz) Mach-Zehnder type FDM coupler was obtained. We also fabricated 1.3/1.55 µm directional coupler type WDM coupler with very low insertion loss.

Publication: IEICE TRANSACTIONS on Electronics Vol.E80-C No.1 pp.130-133

Publication Date: 1997/01/25

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Type of Manuscript: Special Section PAPER (Special Issue on Devices, Packaging Technology, and Subsystems for the Optical Access Network)

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Tadahiko HANADA, Tuyoshi SHIMODA, Mitsuhiro KITAMURA, Sinichi NAKAMURA, "FDM/WDM Couplers Using Silica Waveguide Deposited by APCVD" in IEICE TRANSACTIONS on Electronics, vol. E80-C, no. 1, pp. 130-133, January 1997, doi: .
Abstract: We describe the design, fabrication, and characteristics of FDM/WDM coupler deposited by TEOS-O₃ based APCVD method on silicon substrates. Due to drastically reduced birefringence by APCVD process, completely polarization independent narrow band (100 GHz) Mach-Zehnder type FDM coupler was obtained. We also fabricated 1.3/1.55 µm directional coupler type WDM coupler with very low insertion loss.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e80-c_1_130/_p

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@ARTICLE{e80-c_1_130,
author={Tadahiko HANADA, Tuyoshi SHIMODA, Mitsuhiro KITAMURA, Sinichi NAKAMURA, },
journal={IEICE TRANSACTIONS on Electronics},
title={FDM/WDM Couplers Using Silica Waveguide Deposited by APCVD},
year={1997},
volume={E80-C},
number={1},
pages={130-133},
abstract={We describe the design, fabrication, and characteristics of FDM/WDM coupler deposited by TEOS-O₃ based APCVD method on silicon substrates. Due to drastically reduced birefringence by APCVD process, completely polarization independent narrow band (100 GHz) Mach-Zehnder type FDM coupler was obtained. We also fabricated 1.3/1.55 µm directional coupler type WDM coupler with very low insertion loss.},
keywords={},
doi={},
ISSN={},
month={January},}

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TY - JOUR
TI - FDM/WDM Couplers Using Silica Waveguide Deposited by APCVD
T2 - IEICE TRANSACTIONS on Electronics
SP - 130
EP - 133
AU - Tadahiko HANADA
AU - Tuyoshi SHIMODA
AU - Mitsuhiro KITAMURA
AU - Sinichi NAKAMURA
PY - 1997
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E80-C
IS - 1
JA - IEICE TRANSACTIONS on Electronics
Y1 - January 1997
AB - We describe the design, fabrication, and characteristics of FDM/WDM coupler deposited by TEOS-O₃ based APCVD method on silicon substrates. Due to drastically reduced birefringence by APCVD process, completely polarization independent narrow band (100 GHz) Mach-Zehnder type FDM coupler was obtained. We also fabricated 1.3/1.55 µm directional coupler type WDM coupler with very low insertion loss.
ER -