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Atomic Scale Simulation of Extended Defects: Monte Carlo Approach

Jaehee LEE, Taeyoung WON

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Summary :

This paper reports a Monte Carlo calculation of the bimolecular reaction of arsenic precipitation. As the accuracy of the numerical solution for the coupled rate equations strongly depends on the size of grid spacing, it is necessary to choose adequate number of rate equations in order to understand the behavior of the extended defects. Therefore, we developed a general kinetic Monte Carlo model for the extended defects, which explicitly takes the time evolution of the size density of the extended defects into account. The Monte Carlo calculation exhibits a quantitative agreement with the experimental data for deactivation, and successfully reproduces the rapid deactivation at the beginning phase followed by slow deactivation in the subsequent steps.

Publication
IEICE TRANSACTIONS on Electronics Vol.E83-C No.8 pp.1253-1258
Publication Date
2000/08/25
Publicized
Online ISSN
DOI
Type of Manuscript
Special Section PAPER (Special Issue on 1999 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'99))
Category
Process Modeling and Simulation

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