The search functionality is under construction.
The search functionality is under construction.

Simulations of High-Frequency Thermal Noise in Silicon-on-Insulator MOSFETs Using Distributed-Transmission-Line Model

Daijiro SUMINO, Yasuhisa OMURA

  • Full Text Views

    0

  • Cite this

Summary :

The radio-frequency thermal noise in fully-depleted (FD) silicon-on-insulator (SOI) MOSFETs and bulk MOSFETs is theoretically examined using a distributed-transmission-line model. It is shown that the thermal noise in a scaled-down SOI MOSFET is basically smaller than that in a scaled-down bulk MOSFET in a wide frequency range. In the radio-frequency range, parasitic resistances in source and drain don't yield a remarkable contribution to the difference in output thermal noise power between scaled-down bulk MOSFETs and scaled-down SOI MOSFETs. However, the output thermal noise of scaled-down SOI MOSFETs with a finite parasitic resistance is smaller than that of scaled-down bulk MOSFETs because of smaller channel capacitance.

Publication
IEICE TRANSACTIONS on Electronics Vol.E85-C No.7 pp.1443-1450
Publication Date
2002/07/01
Publicized
Online ISSN
DOI
Type of Manuscript
Special Section PAPER (Special Issue on Silicon RF Device & Integrated Circuit Technologies)
Category

Authors

Keyword