The Enhancement of Electromigration Lifetime under High Frequency Pulsed Conditions

Kazunori HIRAOKA; Kazumitsu YASUDA

The Enhancement of Electromigration Lifetime under High Frequency Pulsed Conditions

Kazunori HIRAOKA, Kazumitsu YASUDA

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Experimental evidence of a two-step enhancement in electromigration lifetime is presented through pulsed testing that extends over a wide frequency range from 7 mHz to 50 MHz. It is also found, through an accompanying failure analysis, that the failure mechanism is not affected by current pulsing. Test samples were the lowew metal lines and the through-holes in double-level interconnects. The same results were obtained for both samples. The testing temperature of the test conductor was determined considering the Joule heating to eliminate errors in lifetime estimation due to temperature errors. A two-step enhancement in lifetime is extracted by normalizing the pulsed electromigration lifetime by the continuous one. The first step occurs in the frequency range from 0.1 to 10 kHz where the lifetime increases with (duty ratio)^-2 and the second step occurs above 100 kHz with (duty ratio)^-3. The transition frequency in the first-step enhancement shifts to the higher frequency region with a decrease in stress temperature or an increase in current density, whereas the transition frequency in the second step is not affected by these stress conditions. The lifetime enhancement is analyzed in relation to the relaxation process during the current pulsing. According to the two-step behavior, two distinct relaxation times are assumed as opposed to the single relaxation time in other proposed models. The results of the analysis agree with the experimental results for the dependence on the frequency and duty ratio of pulses. The two experimentally derived relaxation times are about 5 s and 1 µs.

Publication: IEICE TRANSACTIONS on Fundamentals Vol.E77-A No.1 pp.195-203

Publication Date: 1994/01/25

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Type of Manuscript: Special Section PAPER (Special Section on Reliability)

Category: Reliability Testing

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Kazunori HIRAOKA, Kazumitsu YASUDA, "The Enhancement of Electromigration Lifetime under High Frequency Pulsed Conditions" in IEICE TRANSACTIONS on Fundamentals, vol. E77-A, no. 1, pp. 195-203, January 1994, doi: .
Abstract: Experimental evidence of a two-step enhancement in electromigration lifetime is presented through pulsed testing that extends over a wide frequency range from 7 mHz to 50 MHz. It is also found, through an accompanying failure analysis, that the failure mechanism is not affected by current pulsing. Test samples were the lowew metal lines and the through-holes in double-level interconnects. The same results were obtained for both samples. The testing temperature of the test conductor was determined considering the Joule heating to eliminate errors in lifetime estimation due to temperature errors. A two-step enhancement in lifetime is extracted by normalizing the pulsed electromigration lifetime by the continuous one. The first step occurs in the frequency range from 0.1 to 10 kHz where the lifetime increases with (duty ratio)^-2 and the second step occurs above 100 kHz with (duty ratio)^-3. The transition frequency in the first-step enhancement shifts to the higher frequency region with a decrease in stress temperature or an increase in current density, whereas the transition frequency in the second step is not affected by these stress conditions. The lifetime enhancement is analyzed in relation to the relaxation process during the current pulsing. According to the two-step behavior, two distinct relaxation times are assumed as opposed to the single relaxation time in other proposed models. The results of the analysis agree with the experimental results for the dependence on the frequency and duty ratio of pulses. The two experimentally derived relaxation times are about 5 s and 1 µs.
URL: https://global.ieice.org/en_transactions/fundamentals/10.1587/e77-a_1_195/_p

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@ARTICLE{e77-a_1_195,
author={Kazunori HIRAOKA, Kazumitsu YASUDA, },
journal={IEICE TRANSACTIONS on Fundamentals},
title={The Enhancement of Electromigration Lifetime under High Frequency Pulsed Conditions},
year={1994},
volume={E77-A},
number={1},
pages={195-203},
abstract={Experimental evidence of a two-step enhancement in electromigration lifetime is presented through pulsed testing that extends over a wide frequency range from 7 mHz to 50 MHz. It is also found, through an accompanying failure analysis, that the failure mechanism is not affected by current pulsing. Test samples were the lowew metal lines and the through-holes in double-level interconnects. The same results were obtained for both samples. The testing temperature of the test conductor was determined considering the Joule heating to eliminate errors in lifetime estimation due to temperature errors. A two-step enhancement in lifetime is extracted by normalizing the pulsed electromigration lifetime by the continuous one. The first step occurs in the frequency range from 0.1 to 10 kHz where the lifetime increases with (duty ratio)^-2 and the second step occurs above 100 kHz with (duty ratio)^-3. The transition frequency in the first-step enhancement shifts to the higher frequency region with a decrease in stress temperature or an increase in current density, whereas the transition frequency in the second step is not affected by these stress conditions. The lifetime enhancement is analyzed in relation to the relaxation process during the current pulsing. According to the two-step behavior, two distinct relaxation times are assumed as opposed to the single relaxation time in other proposed models. The results of the analysis agree with the experimental results for the dependence on the frequency and duty ratio of pulses. The two experimentally derived relaxation times are about 5 s and 1 µs.},
keywords={},
doi={},
ISSN={},
month={January},}

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TY - JOUR
TI - The Enhancement of Electromigration Lifetime under High Frequency Pulsed Conditions
T2 - IEICE TRANSACTIONS on Fundamentals
SP - 195
EP - 203
AU - Kazunori HIRAOKA
AU - Kazumitsu YASUDA
PY - 1994
DO -
JO - IEICE TRANSACTIONS on Fundamentals
SN -
VL - E77-A
IS - 1
JA - IEICE TRANSACTIONS on Fundamentals
Y1 - January 1994
AB - Experimental evidence of a two-step enhancement in electromigration lifetime is presented through pulsed testing that extends over a wide frequency range from 7 mHz to 50 MHz. It is also found, through an accompanying failure analysis, that the failure mechanism is not affected by current pulsing. Test samples were the lowew metal lines and the through-holes in double-level interconnects. The same results were obtained for both samples. The testing temperature of the test conductor was determined considering the Joule heating to eliminate errors in lifetime estimation due to temperature errors. A two-step enhancement in lifetime is extracted by normalizing the pulsed electromigration lifetime by the continuous one. The first step occurs in the frequency range from 0.1 to 10 kHz where the lifetime increases with (duty ratio)^-2 and the second step occurs above 100 kHz with (duty ratio)^-3. The transition frequency in the first-step enhancement shifts to the higher frequency region with a decrease in stress temperature or an increase in current density, whereas the transition frequency in the second step is not affected by these stress conditions. The lifetime enhancement is analyzed in relation to the relaxation process during the current pulsing. According to the two-step behavior, two distinct relaxation times are assumed as opposed to the single relaxation time in other proposed models. The results of the analysis agree with the experimental results for the dependence on the frequency and duty ratio of pulses. The two experimentally derived relaxation times are about 5 s and 1 µs.
ER -