IEICE TRANSACTIONS on Fundamentals
A Novel Layout Approach Using Dual Supply Voltage Technique on Body-Tied PD-SOI
Summary :
This paper presents a novel layout approach using dual supply voltage technique. In Placing and Routing (P&R) phase, conventional approaches for dual supply voltages need to separate low supply voltage cells from high voltage ones. Consequently its layout tends to be complex compared with single supply voltage layout. Our layout approach uses cells having two supply voltage rails. Making these cells is difficult in bulk due to increase in area by n-well isolation or in delay by negative body bias caused by sharing n-well. On the other hand, making cells with two supply voltage rails is easy in body-tied PD-SOI owing to trench isolation of each body of transistor. Since our approach for dual supply voltages offers freedom for placement as much as conventional ones for single supply voltage, exsting P&R tools can be used without special operation. Simulation results with MCNC circuits and adders show that our approach reduces power by 23% and 25%, respectively, showing almost the same delay with single supply voltage layout.
- Publication
- IEICE TRANSACTIONS on Fundamentals Vol.E87-A No.12 pp.3244-3250
- Publication Date
- 2004/12/01
- Publicized
- Online ISSN
- DOI
- Type of Manuscript
- Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
- Category
- Floorplan
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Kazuki FUKUOKA, Masaaki IIJIMA, Kenji HAMADA, Masahiro NUMA, Akira TADA, "A Novel Layout Approach Using Dual Supply Voltage Technique on Body-Tied PD-SOI" in IEICE TRANSACTIONS on Fundamentals,
vol. E87-A, no. 12, pp. 3244-3250, December 2004, doi: .
Abstract: This paper presents a novel layout approach using dual supply voltage technique. In Placing and Routing (P&R) phase, conventional approaches for dual supply voltages need to separate low supply voltage cells from high voltage ones. Consequently its layout tends to be complex compared with single supply voltage layout. Our layout approach uses cells having two supply voltage rails. Making these cells is difficult in bulk due to increase in area by n-well isolation or in delay by negative body bias caused by sharing n-well. On the other hand, making cells with two supply voltage rails is easy in body-tied PD-SOI owing to trench isolation of each body of transistor. Since our approach for dual supply voltages offers freedom for placement as much as conventional ones for single supply voltage, exsting P&R tools can be used without special operation. Simulation results with MCNC circuits and adders show that our approach reduces power by 23% and 25%, respectively, showing almost the same delay with single supply voltage layout.
URL: https://global.ieice.org/en_transactions/fundamentals/10.1587/e87-a_12_3244/_p
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@ARTICLE{e87-a_12_3244,
author={Kazuki FUKUOKA, Masaaki IIJIMA, Kenji HAMADA, Masahiro NUMA, Akira TADA, },
journal={IEICE TRANSACTIONS on Fundamentals},
title={A Novel Layout Approach Using Dual Supply Voltage Technique on Body-Tied PD-SOI},
year={2004},
volume={E87-A},
number={12},
pages={3244-3250},
abstract={This paper presents a novel layout approach using dual supply voltage technique. In Placing and Routing (P&R) phase, conventional approaches for dual supply voltages need to separate low supply voltage cells from high voltage ones. Consequently its layout tends to be complex compared with single supply voltage layout. Our layout approach uses cells having two supply voltage rails. Making these cells is difficult in bulk due to increase in area by n-well isolation or in delay by negative body bias caused by sharing n-well. On the other hand, making cells with two supply voltage rails is easy in body-tied PD-SOI owing to trench isolation of each body of transistor. Since our approach for dual supply voltages offers freedom for placement as much as conventional ones for single supply voltage, exsting P&R tools can be used without special operation. Simulation results with MCNC circuits and adders show that our approach reduces power by 23% and 25%, respectively, showing almost the same delay with single supply voltage layout.},
keywords={},
doi={},
ISSN={},
month={December},}
Copy
TY - JOUR
TI - A Novel Layout Approach Using Dual Supply Voltage Technique on Body-Tied PD-SOI
T2 - IEICE TRANSACTIONS on Fundamentals
SP - 3244
EP - 3250
AU - Kazuki FUKUOKA
AU - Masaaki IIJIMA
AU - Kenji HAMADA
AU - Masahiro NUMA
AU - Akira TADA
PY - 2004
DO -
JO - IEICE TRANSACTIONS on Fundamentals
SN -
VL - E87-A
IS - 12
JA - IEICE TRANSACTIONS on Fundamentals
Y1 - December 2004
AB - This paper presents a novel layout approach using dual supply voltage technique. In Placing and Routing (P&R) phase, conventional approaches for dual supply voltages need to separate low supply voltage cells from high voltage ones. Consequently its layout tends to be complex compared with single supply voltage layout. Our layout approach uses cells having two supply voltage rails. Making these cells is difficult in bulk due to increase in area by n-well isolation or in delay by negative body bias caused by sharing n-well. On the other hand, making cells with two supply voltage rails is easy in body-tied PD-SOI owing to trench isolation of each body of transistor. Since our approach for dual supply voltages offers freedom for placement as much as conventional ones for single supply voltage, exsting P&R tools can be used without special operation. Simulation results with MCNC circuits and adders show that our approach reduces power by 23% and 25%, respectively, showing almost the same delay with single supply voltage layout.
ER -
English
