On the Measurement of Film Thickness by a Polarization Interferometer

Vijay T. CHITNIS; Yoshiyuki UCHIDA; Shuzo HATTORI

On the Measurement of Film Thickness by a Polarization Interferometer

Vijay T. CHITNIS, Yoshiyuki UCHIDA, Shuzo HATTORI

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A polarization interferometer capable of measuring film thicknesses ranging from 10 to 3000 is described. A suitable system for measuring thickness of films in resist patterns is designed. The film thickness is measured in terms of the azimuth angle rotation of a plane polarized light. Experimental details are given, along with the results of thickness measurement of Alluminium films. Possible sources of errors and various parameters affecting the precision of measurement are discussed. The measurement error is estimated to be less than 0.1% . The precision of measurement is found to be 30 under normal laboratory conditions and can be improved to 1 by protecting the system from environmental disturbances. With some design modifications, the system could be used for the measurement of very narrow profile of films such as one we meet in the case of the resist pattern. Calculations show that resist films with widths of profile as small as 6 µm can be measured by this method.

Publication: IEICE TRANSACTIONS on transactions Vol.E66-E No.11 pp.649-652

Publication Date: 1983/11/25

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Type of Manuscript: PAPER

Category: Optical and Quantum Electronics

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Vijay T. CHITNIS
Yoshiyuki UCHIDA
Shuzo HATTORI

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Vijay T. CHITNIS, Yoshiyuki UCHIDA, Shuzo HATTORI, "On the Measurement of Film Thickness by a Polarization Interferometer" in IEICE TRANSACTIONS on transactions, vol. E66-E, no. 11, pp. 649-652, November 1983, doi: .
Abstract: A polarization interferometer capable of measuring film thicknesses ranging from 10 to 3000 is described. A suitable system for measuring thickness of films in resist patterns is designed. The film thickness is measured in terms of the azimuth angle rotation of a plane polarized light. Experimental details are given, along with the results of thickness measurement of Alluminium films. Possible sources of errors and various parameters affecting the precision of measurement are discussed. The measurement error is estimated to be less than 0.1% . The precision of measurement is found to be 30 under normal laboratory conditions and can be improved to 1 by protecting the system from environmental disturbances. With some design modifications, the system could be used for the measurement of very narrow profile of films such as one we meet in the case of the resist pattern. Calculations show that resist films with widths of profile as small as 6 µm can be measured by this method.
URL: https://global.ieice.org/en_transactions/transactions/10.1587/e66-e_11_649/_p

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@ARTICLE{e66-e_11_649,
author={Vijay T. CHITNIS, Yoshiyuki UCHIDA, Shuzo HATTORI, },
journal={IEICE TRANSACTIONS on transactions},
title={On the Measurement of Film Thickness by a Polarization Interferometer},
year={1983},
volume={E66-E},
number={11},
pages={649-652},
abstract={A polarization interferometer capable of measuring film thicknesses ranging from 10 to 3000 is described. A suitable system for measuring thickness of films in resist patterns is designed. The film thickness is measured in terms of the azimuth angle rotation of a plane polarized light. Experimental details are given, along with the results of thickness measurement of Alluminium films. Possible sources of errors and various parameters affecting the precision of measurement are discussed. The measurement error is estimated to be less than 0.1% . The precision of measurement is found to be 30 under normal laboratory conditions and can be improved to 1 by protecting the system from environmental disturbances. With some design modifications, the system could be used for the measurement of very narrow profile of films such as one we meet in the case of the resist pattern. Calculations show that resist films with widths of profile as small as 6 µm can be measured by this method.},
keywords={},
doi={},
ISSN={},
month={November},}

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TY - JOUR
TI - On the Measurement of Film Thickness by a Polarization Interferometer
T2 - IEICE TRANSACTIONS on transactions
SP - 649
EP - 652
AU - Vijay T. CHITNIS
AU - Yoshiyuki UCHIDA
AU - Shuzo HATTORI
PY - 1983
DO -
JO - IEICE TRANSACTIONS on transactions
SN -
VL - E66-E
IS - 11
JA - IEICE TRANSACTIONS on transactions
Y1 - November 1983
AB - A polarization interferometer capable of measuring film thicknesses ranging from 10 to 3000 is described. A suitable system for measuring thickness of films in resist patterns is designed. The film thickness is measured in terms of the azimuth angle rotation of a plane polarized light. Experimental details are given, along with the results of thickness measurement of Alluminium films. Possible sources of errors and various parameters affecting the precision of measurement are discussed. The measurement error is estimated to be less than 0.1% . The precision of measurement is found to be 30 under normal laboratory conditions and can be improved to 1 by protecting the system from environmental disturbances. With some design modifications, the system could be used for the measurement of very narrow profile of films such as one we meet in the case of the resist pattern. Calculations show that resist films with widths of profile as small as 6 µm can be measured by this method.
ER -