Semi-Insulating Film Deposition at Lower Substrate-Temperatures Using Ar<SUP><cd0215c.gif></SUP>-Beam Sputtering

Tetsuma SAKURAI

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Tetsuma SAKURAI, "Semi-Insulating Film Deposition at Lower Substrate-Temperatures Using Ar-Beam Sputtering" in IEICE TRANSACTIONS on transactions, vol. E67-E, no. 12, pp. 657-658, December 1984, doi: .
Abstract: Properties of a semi-insulating film deposited by Ar-Beam Sputtering have been investigated. This film was characterized with a substrate temperature lower than 150 during deposition. It was found that this film was as efficient in achieving breakdown characteristics higher than 400 V as were the conventional films.
URL: https://global.ieice.org/en_transactions/transactions/10.1587/e67-e_12_657/_p

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@ARTICLE{e67-e_12_657,
author={Tetsuma SAKURAI, },
journal={IEICE TRANSACTIONS on transactions},
title={Semi-Insulating Film Deposition at Lower Substrate-Temperatures Using Ar-Beam Sputtering},
year={1984},
volume={E67-E},
number={12},
pages={657-658},
abstract={Properties of a semi-insulating film deposited by Ar-Beam Sputtering have been investigated. This film was characterized with a substrate temperature lower than 150 during deposition. It was found that this film was as efficient in achieving breakdown characteristics higher than 400 V as were the conventional films.},
keywords={},
doi={},
ISSN={},
month={December},}

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TY - JOUR
TI - Semi-Insulating Film Deposition at Lower Substrate-Temperatures Using Ar-Beam Sputtering
T2 - IEICE TRANSACTIONS on transactions
SP - 657
EP - 658
AU - Tetsuma SAKURAI
PY - 1984
DO -
JO - IEICE TRANSACTIONS on transactions
SN -
VL - E67-E
IS - 12
JA - IEICE TRANSACTIONS on transactions
Y1 - December 1984
AB - Properties of a semi-insulating film deposited by Ar-Beam Sputtering have been investigated. This film was characterized with a substrate temperature lower than 150 during deposition. It was found that this film was as efficient in achieving breakdown characteristics higher than 400 V as were the conventional films.
ER -