The Interfacial Characteristics of MIS Structures Using Carbon Films as Insulator
Summary :
Hard and insulating carbon films were prepared by r.f. plasma chemical vapor deposition with d.c. bias. The interfacial characteristics of MIS structures using carbon films as insulator were investigated. The interface state density was 1011eV
- Publication
- IEICE TRANSACTIONS on transactions Vol.E69-E No.4 pp.479-481
- Publication Date
- 1986/04/25
- Publicized
- Online ISSN
- DOI
- Type of Manuscript
- Special Section LETTER (Special Issue: Papers from 1986 National Convention IECE Japan)
- Category
- Materials
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Keyword
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Kiyoshi ISHII, Hiroto TAKEUCHI, Hiroaki MAKIMURA, Kiichi KAMIMURA, Yoshiharu ONUMA, "The Interfacial Characteristics of MIS Structures Using Carbon Films as Insulator" in IEICE TRANSACTIONS on transactions,
vol. E69-E, no. 4, pp. 479-481, April 1986, doi: .
Abstract: Hard and insulating carbon films were prepared by r.f. plasma chemical vapor deposition with d.c. bias. The interfacial characteristics of MIS structures using carbon films as insulator were investigated. The interface state density was 1011eV
URL: https://global.ieice.org/en_transactions/transactions/10.1587/e69-e_4_479/_p
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@ARTICLE{e69-e_4_479,
author={Kiyoshi ISHII, Hiroto TAKEUCHI, Hiroaki MAKIMURA, Kiichi KAMIMURA, Yoshiharu ONUMA, },
journal={IEICE TRANSACTIONS on transactions},
title={The Interfacial Characteristics of MIS Structures Using Carbon Films as Insulator},
year={1986},
volume={E69-E},
number={4},
pages={479-481},
abstract={Hard and insulating carbon films were prepared by r.f. plasma chemical vapor deposition with d.c. bias. The interfacial characteristics of MIS structures using carbon films as insulator were investigated. The interface state density was 1011eV
keywords={},
doi={},
ISSN={},
month={April},}
Copy
TY - JOUR
TI - The Interfacial Characteristics of MIS Structures Using Carbon Films as Insulator
T2 - IEICE TRANSACTIONS on transactions
SP - 479
EP - 481
AU - Kiyoshi ISHII
AU - Hiroto TAKEUCHI
AU - Hiroaki MAKIMURA
AU - Kiichi KAMIMURA
AU - Yoshiharu ONUMA
PY - 1986
DO -
JO - IEICE TRANSACTIONS on transactions
SN -
VL - E69-E
IS - 4
JA - IEICE TRANSACTIONS on transactions
Y1 - April 1986
AB - Hard and insulating carbon films were prepared by r.f. plasma chemical vapor deposition with d.c. bias. The interfacial characteristics of MIS structures using carbon films as insulator were investigated. The interface state density was 1011eV
ER -
English
