IEICE TRANSACTIONS on transactions
Ellipsometric Analysis for Growth of Contaminant Films on Contact Surface
Summary :
By applying the ellipsometric analysis, the relationships between the growth of contaminant film on contact surface and contamination time were clarified with respect to the contact resistance and formation of the film. Contamination parameters for reaction formulas which are concerned with growth laws of contamination films for sulfuration of Ag and for oxidation of Cu were deduced.
- Publication
- IEICE TRANSACTIONS on transactions Vol.E70-E No.4 pp.343-345
- Publication Date
- 1987/04/25
- Publicized
- Online ISSN
- DOI
- Type of Manuscript
- Special Section LETTER (Special Issue: Papers from 1987 National Convention IEICE)
- Category
- Components and Materials
Authors
Keyword
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Terutaka TAMAI, Mitsuo KOMINAMI, "Ellipsometric Analysis for Growth of Contaminant Films on Contact Surface" in IEICE TRANSACTIONS on transactions,
vol. E70-E, no. 4, pp. 343-345, April 1987, doi: .
Abstract: By applying the ellipsometric analysis, the relationships between the growth of contaminant film on contact surface and contamination time were clarified with respect to the contact resistance and formation of the film. Contamination parameters for reaction formulas which are concerned with growth laws of contamination films for sulfuration of Ag and for oxidation of Cu were deduced.
URL: https://global.ieice.org/en_transactions/transactions/10.1587/e70-e_4_343/_p
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@ARTICLE{e70-e_4_343,
author={Terutaka TAMAI, Mitsuo KOMINAMI, },
journal={IEICE TRANSACTIONS on transactions},
title={Ellipsometric Analysis for Growth of Contaminant Films on Contact Surface},
year={1987},
volume={E70-E},
number={4},
pages={343-345},
abstract={By applying the ellipsometric analysis, the relationships between the growth of contaminant film on contact surface and contamination time were clarified with respect to the contact resistance and formation of the film. Contamination parameters for reaction formulas which are concerned with growth laws of contamination films for sulfuration of Ag and for oxidation of Cu were deduced.},
keywords={},
doi={},
ISSN={},
month={April},}
Copy
TY - JOUR
TI - Ellipsometric Analysis for Growth of Contaminant Films on Contact Surface
T2 - IEICE TRANSACTIONS on transactions
SP - 343
EP - 345
AU - Terutaka TAMAI
AU - Mitsuo KOMINAMI
PY - 1987
DO -
JO - IEICE TRANSACTIONS on transactions
SN -
VL - E70-E
IS - 4
JA - IEICE TRANSACTIONS on transactions
Y1 - April 1987
AB - By applying the ellipsometric analysis, the relationships between the growth of contaminant film on contact surface and contamination time were clarified with respect to the contact resistance and formation of the film. Contamination parameters for reaction formulas which are concerned with growth laws of contamination films for sulfuration of Ag and for oxidation of Cu were deduced.
ER -
English
