XPS Study of Aluminum Oxide Films Formed by ECR Plasma Anodization
Summary :
The thin aluminum oxide film formed by ECR plasma anodization was studied by x-ray photoelectron spectroscopy. It was observed that the composition ratio of the oxygen atom to the aluminum atom is actually smaller than the stoichiometric binding ratio. This result means that oxygen atoms are not easy to be taken into the film during plasma anodization. In other words, the anodization is performed without enough supply of oxygen atoms generated in the plasma. This fact suggests that the oxidation rate is limited by the generation rate of oxygen atom playing an important role in the process of the oxide growth.
- Publication
- IEICE TRANSACTIONS on transactions Vol.E72-E No.10 pp.1066-1068
- Publication Date
- 1989/10/25
- Publicized
- Online ISSN
- DOI
- Type of Manuscript
- Special Section LETTER (Special Issue on 1989 Autumn National Convention IEICE)
- Category
- Component and Materials
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Koki MATSUMURA, "XPS Study of Aluminum Oxide Films Formed by ECR Plasma Anodization" in IEICE TRANSACTIONS on transactions,
vol. E72-E, no. 10, pp. 1066-1068, October 1989, doi: .
Abstract: The thin aluminum oxide film formed by ECR plasma anodization was studied by x-ray photoelectron spectroscopy. It was observed that the composition ratio of the oxygen atom to the aluminum atom is actually smaller than the stoichiometric binding ratio. This result means that oxygen atoms are not easy to be taken into the film during plasma anodization. In other words, the anodization is performed without enough supply of oxygen atoms generated in the plasma. This fact suggests that the oxidation rate is limited by the generation rate of oxygen atom playing an important role in the process of the oxide growth.
URL: https://global.ieice.org/en_transactions/transactions/10.1587/e72-e_10_1066/_p
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@ARTICLE{e72-e_10_1066,
author={Koki MATSUMURA, },
journal={IEICE TRANSACTIONS on transactions},
title={XPS Study of Aluminum Oxide Films Formed by ECR Plasma Anodization},
year={1989},
volume={E72-E},
number={10},
pages={1066-1068},
abstract={The thin aluminum oxide film formed by ECR plasma anodization was studied by x-ray photoelectron spectroscopy. It was observed that the composition ratio of the oxygen atom to the aluminum atom is actually smaller than the stoichiometric binding ratio. This result means that oxygen atoms are not easy to be taken into the film during plasma anodization. In other words, the anodization is performed without enough supply of oxygen atoms generated in the plasma. This fact suggests that the oxidation rate is limited by the generation rate of oxygen atom playing an important role in the process of the oxide growth.},
keywords={},
doi={},
ISSN={},
month={October},}
Copy
TY - JOUR
TI - XPS Study of Aluminum Oxide Films Formed by ECR Plasma Anodization
T2 - IEICE TRANSACTIONS on transactions
SP - 1066
EP - 1068
AU - Koki MATSUMURA
PY - 1989
DO -
JO - IEICE TRANSACTIONS on transactions
SN -
VL - E72-E
IS - 10
JA - IEICE TRANSACTIONS on transactions
Y1 - October 1989
AB - The thin aluminum oxide film formed by ECR plasma anodization was studied by x-ray photoelectron spectroscopy. It was observed that the composition ratio of the oxygen atom to the aluminum atom is actually smaller than the stoichiometric binding ratio. This result means that oxygen atoms are not easy to be taken into the film during plasma anodization. In other words, the anodization is performed without enough supply of oxygen atoms generated in the plasma. This fact suggests that the oxidation rate is limited by the generation rate of oxygen atom playing an important role in the process of the oxide growth.
ER -
English
