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Mitiko MIURA-MATTAUSCH Hiroaki UENO Hans Juergen MATTAUSCH Keiichi MORIKAWA Satoshi ITOH Akiyoshi KOBAYASHI Hiroo MASUDA
The key elements of sub-100 nm MOSFET modeling for circuit simulation are accurate representation of new physical phenomena arising from advancing technologies and numerical efficacy. We summarize the history of MOSFET modeling, and address difficulties faced by conventional methods. The advantage of the surface-potential-based approach will be emphasized. Perspectives for next generations will be also discussed.