1-2hit |
Alexander BURENKOV Klaus TIETZEL Andreas HOSSINGER Jurgen LORENZ Heiner RYSSEL Siegfried SELBERHERR
The high accuracy which is necessary for modern process simulation often requires the use of Monte-Carlo ion implantation simulation methods with the disadvantage of very long simulation times especially for three-dimensional applications. In this work a new method for an accurate and CPU time efficient three-dimensional simulation of ion implantation is suggested. The approach is based on a combination of the algorithmic capabilities of a fast analytical and the Monte-Carlo simulation method.
Appropriate meshes are crucial for accurate and efficient 3D process simulation. In this paper, we present a set of tools operating on surface and interface triangulations. These tools allow the improvement of the accuracy of interfaces, the reduction of the number of triangles, and the removal of obtuse not coplanarily compensated triangles. The first tool is used within integrated topography simulation environments based on different data structures, e.g. cell-based and segment-based. The latter two are particularly important for providing appropriate input to mesh generation for 3D process simulation.