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Yoshihiro MIYAZAWA Makoto HASHIMOTO Naoki NAGASHIMA Hiroshi SATO Muneharu SHIMANOE Katsunori SENO Fumio MIYAJI Takeshi MATSUSHITA
SOI technology has been developed for not only future ULSI, but also intelligent power ICs and sensors. In this paper the SOI fabrication process with wafer bonding and polish-stopper technologies, and its advantages for future ULSI are shown. And high crystal quality of SOI films fabricated with this method, and high speed performance of SOI devices and circuits, are shown from the data of 256 kb full CMOS SRAM chips. Moreover it is shown from the fabrication data of 4 Mb full CMOS SRAM cells that this technology has a large flexibility on device structure design. These results mean that our technology has great advantages for reduction of cell size and improvement of circuit performance.
Takahiro SEKI Satoshi AKUI Katsunori SENO Masakatsu NAKAI Tetsumasa MEGURO Tetsuo KONDO Akihiko HASHIGUCHI Hirokazu KAWAHARA Kazuo KUMANO Masayuki SHIMURA
In this paper, a Dynamic Voltage and Frequency Management (DVFM) scheme introduced in a microprocessor for handheld devices with wideband embedded DRAM is reported. Our DVFM scheme reduces the power consumption effectively by cooperation of the autonomous clock frequency control and the adaptive supply voltage control. The clock frequency is controlled using hardware activity information to determine the minimum value required by the current processor load. This clock frequency control is realized without special power management software. The supply voltage is controlled according to the delay information provided from a delay synthesizer circuit, which consists of three programmable delay components, gate delay, RC delay and a rise/fall delay. The delay synthesizer circuit emulates the critical-path delay within 4% voltage accuracy over the full range of process deviation and voltage. This accurate tracking ability realizes the supply voltage scaling according to the fluctuation of the LSI's characteristic caused by the temperature and process deviation. The DVFM contributes not only the dynamic power reduction, but also the leakage power reduction. This microprocessor, fabricated in 0.18 µm CMOS embedded DRAM technology achieves 82% power reduction in a Personal Information Management scheduler (PIM) application and 40% power reduction in a MPEG4 movie playback application. As process technology shrinks, the DVFM scheme with leakage power compensation effect will become more important realizing in high-performance and low-power mobile consumer applications.
Akihiko HASHIGUCHI Masuyoshi KUROKAWA Ken'ichiro NAKAMURA Hiroshi OKUDA Koji AOYAMA Mitsuharu OHKI Katsunori SENO Ichiro KUMATA Masatoshi AIKAWA Hirokazu HANAKI Takao YAMAZAKI Mitsuo SONEDA Seiichiro IWASE
A programmable DSP with linear array architecture for real-time video processing is reported. It achieves a processing rate of 5. 4 GOPS and 81GB/s memory bandwidth using Dual Sense Amplifier architecture. A low-power-supply pipeline decreases power consumption and a time shared bit-line reduces chip area. It has 4320 processor elements and a 1. 1 Mbit 3-port memory. The DSP can be applied to HDTV signals with its 75 MHz peak I/O rate. Sufficient programmability is provided to execute video format conversion such as image size conversion and Y/C separation, and picture quality improvement such as noise reduction and image enhancement. The chip was fabricated using 0. 4 µm CMOS triple metal technology with a 15. 12 mm 14. 95 mm die. It operates at 50 MHz and consumes 0. 53 W/GOPS at 3. 3 V.