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[Author] Kenichi HATASAKO(1hit)

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  • Past and Future Technology for Mixed Signal LSI Open Access

    Kenichi HATASAKO  Tetsuya NITTA  Masami HANE  Shigeto MAEGAWA  

     
    INVITED PAPER

      Vol:
    E97-C No:4
      Page(s):
    238-244

    This paper discusses Mixed Signal LSI technology with embedded power transistors. Trends in Mixed Signal LSI technology are explained at first. Mixed signal LSI technology has proceeded with the help of fine fabrication technology and SOI technology. The BEOL transistor is a new development, which uses InGaZnO (IGZO) as its TFT channel material. The BEOL transistor is one future device which enables 3D IC and chip shrinking technology.