Thin films of carbon (C)-sulfur (S) compound were formed by plasma CVD (PCVD) at the special chemical condition. The reactor has a parallel plate electrode system and was operated at a discharge frequency of 13.56 MHz with using a mixture gas of argon (Ar), methane (CH4) and SF6. The deposition was performed on a substrate placed on the grounded electrode. Atomic composition of the film was observed to depend on the gas mixture ratio. The sulfur atom density was increased up to 30% with using a mixture gas at a pressure of 0.1 Torr and at a flow rate of 20, 20 and 50 SCCM for Ar, CH4 and SF6, respectively. It was expected that the C-S compounds were deposited under the condition of F atom elimination by forming HF.