Thin films of carbon (C)-sulfur (S) compound were formed by plasma CVD (PCVD) at the special chemical condition. The reactor has a parallel plate electrode system and was operated at a discharge frequency of 13.56 MHz with using a mixture gas of argon (Ar), methane (CH4) and SF6. The deposition was performed on a substrate placed on the grounded electrode. Atomic composition of the film was observed to depend on the gas mixture ratio. The sulfur atom density was increased up to 30% with using a mixture gas at a pressure of 0.1 Torr and at a flow rate of 20, 20 and 50 SCCM for Ar, CH4 and SF6, respectively. It was expected that the C-S compounds were deposited under the condition of F atom elimination by forming HF.

AFM/STM observations were performed on sub nm thick C-Au-S film by co-operation process of plasma CVD and sputtering with using CH4, SF6 and Ar mixture gas and Au plate discharge electrode. From the refractive index values, the conductive granular molecules with a size of 0.4-0.6 nm were expected to exist in the film. For the film at thickness similar to the molecular size, Ra (arithmetic mean departures of roughness profile from the mean line) values were measured to be 0.712/6.10 nm by AFM/STM measurement, respectively. The one order large STM Ra value compared to the AFM Ra value suggests that the film contains conductive granular molecules.

Carbon-gold (C-Au) film was formed by co-operation process of plasma CVD and sputtering with using methane and Ar mixture gas and gold plate discharge electrode. Refractive index of 3.1 for the film was obtained at Au atom content of 5.5 atomic%. The optical transmittance was improved significantly in the visible light wavelength range compared to the C-S-Au film reported previously. Au atom distribution in the C-Au film and the electronic polarizabilities were discussed in the relation to the refractive index.