In this study, the reference pure metal-oxide semiconductor field-effect transistors (MOSFETs) and low-voltage (LV) and high-voltage (HV) MOSFETs with a super-junction (SJ) structure in the drain side were experimentally compared. The results show that the drain-side engineering of SJs exerts negative effects on the electrostatic discharge (ESD) and latch-up (LU) immunities of LV n-channel MOSFETs, whereas for LV p-channel MOSFETs and HV n-channel laterally diffused MOSFETs (nLDMOSs), the effects are positive. Compared with the pure MOSFET, electrostatic discharge (ESD) robustness (It2) decreased by approximately 30.25% for the LV nMOS-SJ, whereas It2 increased by approximately 2.42% and 46.63% for the LV pMOS-SJ and HV nLDMOS-SJ, respectively; furthermore, LU immunity (Vh) decreased by approximately 5.45% for the LV nMOS-SJ, whereas Vh increased by approximately 0.44% and 35.5% for the LV pMOS-SJ and HV nLDMOS-SJ, respectively. Thus, nMOS-SJ (pMOS-SJ and nLDMOS-SJ) has lower (higher) It2 and Vh, and this drain-side SJ structure of MOSFETs is an inferior (superior) choice for improving the ESD/LU reliability of LV nMOSs (LV pMOS and HV nLDMOS).

Improving robustness in electrostatic discharge (ESD) protection by inserting drain-side isolated silicon-controlled rectifiers (SCRs) in a high-voltage (HV) p-channel lateral-diffused MOSFET (pLDMOS) device was investigated in this paper. Additionally, the effects of anti-ESD reliability in the HV pLDMOS transistors provided by this technique were evaluated. From the experimental data, it was determined that the holding voltage (Vh) values of the pLDMOS with an embedded npn-arranged SCR and discrete thin-oxide (OD) layout on the cathode side increased as the parasitic SCR OD row number decreased. Moreover, the trigger voltage (Vt1) and the Vh values of the pLDMOS with a parasitic pnp-arranged SCR and discrete OD layout on the drain side fluctuated slightly as the SCR OD-row number decreased. Furthermore, the secondary breakdown current (It2) values (i.e., the equivalent ESD-reliability robustness) of all pLDMOS-SCR npn-arranged types increased (>408.4%) to a higher degree than those of the pure pLDMOS, except for npn-DIS_3 and npn-DIS_2, which had low areas of SCRs. All pLDMOS-SCR pnp-arranged types exhibited an increase of up to 2.2A-2.4A, except for the pnp_DIS_3 and pnp_DIS_2 samples; the pnp_DIS_91 increased by approximately 2000.9% (249.1%), exhibiting a higher increase than that of the reference pLDMOS (i.e., the corresponding pnp-stripe type). The ESD robustness of the pLDMOS-SCR pnp-arranged type and npn-arranged type with a discrete OD layout on the SCR cathode side was greater than that of the corresponding pLDMOS-SCR stripe type and a pure pLDMOS, particularly in the pLDMOS-SCR pnp-arranged type.

The novel SCR-based (silicon controlled rectifier) device for ESD power clamp is presented in this paper. The proposed device has a high holding voltage and a high triggering current characteristic. These characteristics enable latch-up immune normal operation as well as superior full chip ESD protection. The device has a small area in requirement robustness in comparison to ggNMOS (gate grounded NMOS). The proposed ESD protection device is designed in 0.25 µm and 0.5 µm CMOS Technology. In the experimental result, the proposed ESD clamp has a double trigger characteristic, a high holding voltage of 4 V and a high trigger current of above 350 mA. The robustness has measured to HBM 8 kV (HBM: Human Body Model) and MM 400 V (MM: Machine Model). The proposed device has a high level It2 of 52 mA/ µm approximately.