This paper discusses crystal-growth and device-design issues associated with the development of high-performance InP/InGaAs heretostructure bipolar transistors (HBTs). It is shown that a highly Si-doped n+-subcollector in the HBT structure causes anomalous Zn redistribution during metalorganic vapor phase epitaxial (MOVPE) growth. A thermodynamical model of and a useful solution to this big problem are presented. A novel hybrid structure consisting of an abrupt emitter-base heterojunction and a compositionally-graded base is shown to enhance nonequilibrium base transport and thereby increase current gain and cutoff frequency fT. A double-heterostructure bipolar transistor (DHBT) with a step-graded InGaAsP collector can improve collector breakdown behavior without any speed penalty. We also elucidate the effect of emitter size shrinkage on high-frequency performance. Maximum oscillation frequency fmax in excess of 250 GHz is reported.

An efficient method which integrates a 2-D energy transport model, impact ionization model, gate current model, a discretized gate-capacitor EPROM model, and a post-processing quasi-transient programming/erase method, was developed for deep-submicron EPROM/Flash device simulation. The predicted results showed on the average better than 90% accuracy, and it took only few minutes CPU time on a SUN/SPARC2 to generate EPROM/Flash Vt shift curves.