We demonstrate the wavelength trimming of MEMS VCSELs by etching a cantilever-shaped top mirror using FIB etching. The proposed technique can be used for the post-process precise wavelength allocation of athermal MEMS VCSELs. The modeling and experimental results on 850 nm MEMS VCSELs are presented. The results show a possibility of realizing both red-shift and blue-shift wavelength changes by choosing the etching area of the cantilever.

A novel temperature insensitive wavelength filter consisting of GaAlAs/GaAs distributed Bragg reflectors (DBRs) has been demonstrated. This micromachined DBR is mechanically tuned by differential thermal expansion. The strain-induced displacement of one mirror can generate wavelength tuning and trimming functions with an adjustable temperature dependence. We succeeded in the control of temperature dependence in this micromachined semiconductor filter by properly designing a vertical cavity structure. The achieved temperature dependence was as small as +0.01 nm/K, which is one-tenth of that of conventional semiconductor based optical filters. Also, a wavelength trimming of over 20 nm was demonstrated after completing the device fabrication. In addition, we demonstrated a 4 4 multiple wavelength micromachined vertical cavity filter array. The multi-wavelength filter array with a wavelength span of 45 nm was fabricated by partially etching off a GaAs wavelength control layer loaded on the top surface of device.

A novel temperature insensitive wavelength filter consisting of GaAlAs/GaAs distributed Bragg reflectors (DBRs) has been demonstrated. This micromachined DBR is mechanically tuned by differential thermal expansion. The strain-induced displacement of one mirror can generate wavelength tuning and trimming functions with an adjustable temperature dependence. We succeeded in the control of temperature dependence in this micromachined semiconductor filter by properly designing a vertical cavity structure. The achieved temperature dependence was as small as +0.01 nm/K, which is one-tenth of that of conventional semiconductor based optical filters. Also, a wavelength trimming of over 20 nm was demonstrated after completing the device fabrication. In addition, we demonstrated a 4 4 multiple wavelength micromachined vertical cavity filter array. The multi-wavelength filter array with a wavelength span of 45 nm was fabricated by partially etching off a GaAs wavelength control layer loaded on the top surface of device.