Material and Manufacturing Process Technologies of Discharge Deactivation Film for Stripe Rib PDPs

Shinichiro NAGANO; Shigeki HARADA; Keisuke JO; Ko SANO

doi:10.1093/ietele/e88-c.11.2070

Material and Manufacturing Process Technologies of Discharge Deactivation Film for Stripe Rib PDPs

Shinichiro NAGANO, Shigeki HARADA, Keisuke JO, Ko SANO

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We developed material and process technologies concerned to DDF, which is formed on MgO surface around the inter-pixel gap to prevent vertical crosstalk discharge in stripe rib structure. First we tried with thin film deposition and lift-off patterning to find Al₂O₃ and TiO₂ are both available for DDF material. Next we tried with thick film printing in favor of mass productivity for large size PDPs. In case DDF included PbO glass, we met serious hardship in generating discharge. The problem was perfectly solved by having thick film DDF composed of 100 nm sized Al₂O₃ grains without glass component. Its γ_i was about 1/5 that of MgO, suggesting that the thick film DDF is almost compatible with thin film Al₂O₃ in electron emission characteristics. Such very small grain size contributes to DDF transparency, which is excellently high. In addition to it, such DDF is equipped with cushioning effect to prevent dot defects caused by rib breakage. Furthermore the DDF functions as getter during panel exhaustion to bring deep blue color by promoting deoxidization of blue phosphor provided that its volume is small enough. Transparent DDF may be rather better than black one with respect to bright room contrast ratio, not to mention to avoiding terrible sparking discharge. Thus material and process technologies for DDF have been almost fixed in success.

Publication: IEICE TRANSACTIONS on Electronics Vol.E88-C No.11 pp.2070-2077

Publication Date: 2005/11/01

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DOI: 10.1093/ietele/e88-c.11.2070

Type of Manuscript: Special Section PAPER (Special Section on Electronic Displays)

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Shinichiro NAGANO, Shigeki HARADA, Keisuke JO, Ko SANO, "Material and Manufacturing Process Technologies of Discharge Deactivation Film for Stripe Rib PDPs" in IEICE TRANSACTIONS on Electronics, vol. E88-C, no. 11, pp. 2070-2077, November 2005, doi: 10.1093/ietele/e88-c.11.2070.
Abstract: We developed material and process technologies concerned to DDF, which is formed on MgO surface around the inter-pixel gap to prevent vertical crosstalk discharge in stripe rib structure. First we tried with thin film deposition and lift-off patterning to find Al₂O₃ and TiO₂ are both available for DDF material. Next we tried with thick film printing in favor of mass productivity for large size PDPs. In case DDF included PbO glass, we met serious hardship in generating discharge. The problem was perfectly solved by having thick film DDF composed of 100 nm sized Al₂O₃ grains without glass component. Its γ_i was about 1/5 that of MgO, suggesting that the thick film DDF is almost compatible with thin film Al₂O₃ in electron emission characteristics. Such very small grain size contributes to DDF transparency, which is excellently high. In addition to it, such DDF is equipped with cushioning effect to prevent dot defects caused by rib breakage. Furthermore the DDF functions as getter during panel exhaustion to bring deep blue color by promoting deoxidization of blue phosphor provided that its volume is small enough. Transparent DDF may be rather better than black one with respect to bright room contrast ratio, not to mention to avoiding terrible sparking discharge. Thus material and process technologies for DDF have been almost fixed in success.
URL: https://global.ieice.org/en_transactions/electronics/10.1093/ietele/e88-c.11.2070/_p

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@ARTICLE{e88-c_11_2070,
author={Shinichiro NAGANO, Shigeki HARADA, Keisuke JO, Ko SANO, },
journal={IEICE TRANSACTIONS on Electronics},
title={Material and Manufacturing Process Technologies of Discharge Deactivation Film for Stripe Rib PDPs},
year={2005},
volume={E88-C},
number={11},
pages={2070-2077},
abstract={We developed material and process technologies concerned to DDF, which is formed on MgO surface around the inter-pixel gap to prevent vertical crosstalk discharge in stripe rib structure. First we tried with thin film deposition and lift-off patterning to find Al₂O₃ and TiO₂ are both available for DDF material. Next we tried with thick film printing in favor of mass productivity for large size PDPs. In case DDF included PbO glass, we met serious hardship in generating discharge. The problem was perfectly solved by having thick film DDF composed of 100 nm sized Al₂O₃ grains without glass component. Its γ_i was about 1/5 that of MgO, suggesting that the thick film DDF is almost compatible with thin film Al₂O₃ in electron emission characteristics. Such very small grain size contributes to DDF transparency, which is excellently high. In addition to it, such DDF is equipped with cushioning effect to prevent dot defects caused by rib breakage. Furthermore the DDF functions as getter during panel exhaustion to bring deep blue color by promoting deoxidization of blue phosphor provided that its volume is small enough. Transparent DDF may be rather better than black one with respect to bright room contrast ratio, not to mention to avoiding terrible sparking discharge. Thus material and process technologies for DDF have been almost fixed in success.},
keywords={},
doi={10.1093/ietele/e88-c.11.2070},
ISSN={},
month={November},}

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TY - JOUR
TI - Material and Manufacturing Process Technologies of Discharge Deactivation Film for Stripe Rib PDPs
T2 - IEICE TRANSACTIONS on Electronics
SP - 2070
EP - 2077
AU - Shinichiro NAGANO
AU - Shigeki HARADA
AU - Keisuke JO
AU - Ko SANO
PY - 2005
DO - 10.1093/ietele/e88-c.11.2070
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E88-C
IS - 11
JA - IEICE TRANSACTIONS on Electronics
Y1 - November 2005
AB - We developed material and process technologies concerned to DDF, which is formed on MgO surface around the inter-pixel gap to prevent vertical crosstalk discharge in stripe rib structure. First we tried with thin film deposition and lift-off patterning to find Al₂O₃ and TiO₂ are both available for DDF material. Next we tried with thick film printing in favor of mass productivity for large size PDPs. In case DDF included PbO glass, we met serious hardship in generating discharge. The problem was perfectly solved by having thick film DDF composed of 100 nm sized Al₂O₃ grains without glass component. Its γ_i was about 1/5 that of MgO, suggesting that the thick film DDF is almost compatible with thin film Al₂O₃ in electron emission characteristics. Such very small grain size contributes to DDF transparency, which is excellently high. In addition to it, such DDF is equipped with cushioning effect to prevent dot defects caused by rib breakage. Furthermore the DDF functions as getter during panel exhaustion to bring deep blue color by promoting deoxidization of blue phosphor provided that its volume is small enough. Transparent DDF may be rather better than black one with respect to bright room contrast ratio, not to mention to avoiding terrible sparking discharge. Thus material and process technologies for DDF have been almost fixed in success.
ER -