Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment
Summary :
We propose a cell library development methodology for throughput enhancement of character projection equipment. First, an ILP (Integer Linear Programming)-based cell selection is proposed for the equipment for which both of the CP (Character Projection) and VSB (Variable Shaped Beam) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed. Finally, a case study is shown in which the numbers of EB shots are shown for several cases.
- Publication
- IEICE TRANSACTIONS on Electronics Vol.E89-C No.3 pp.377-383
- Publication Date
- 2006/03/01
- Publicized
- Online ISSN
- 1745-1353
- DOI
- 10.1093/ietele/e89-c.3.377
- Type of Manuscript
- Special Section PAPER (Special Section on VLSI Design Technology in the Sub-100 nm Era)
- Category
- CAD
Authors
Makoto SUGIHARA
Taiga TAKATA
Kenta NAKAMURA
Ryoichi INANAMI
Hiroaki HAYASHI
Katsumi KISHIMOTO
Tetsuya HASEBE
Yukihiro KAWANO
Yusuke MATSUNAGA
Kazuaki MURAKAMI
Katsuya OKUMURA
Keyword
Latest Issue
Copyrights notice of machine-translated contents
The copyright of the original papers published on this site belongs to IEICE. Unauthorized use of the original or translated papers is prohibited. See IEICE Provisions on Copyright for details.
Cite this
Copy
Makoto SUGIHARA, Taiga TAKATA, Kenta NAKAMURA, Ryoichi INANAMI, Hiroaki HAYASHI, Katsumi KISHIMOTO, Tetsuya HASEBE, Yukihiro KAWANO, Yusuke MATSUNAGA, Kazuaki MURAKAMI, Katsuya OKUMURA, "Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment" in IEICE TRANSACTIONS on Electronics,
vol. E89-C, no. 3, pp. 377-383, March 2006, doi: 10.1093/ietele/e89-c.3.377.
Abstract: We propose a cell library development methodology for throughput enhancement of character projection equipment. First, an ILP (Integer Linear Programming)-based cell selection is proposed for the equipment for which both of the CP (Character Projection) and VSB (Variable Shaped Beam) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed. Finally, a case study is shown in which the numbers of EB shots are shown for several cases.
URL: https://global.ieice.org/en_transactions/electronics/10.1093/ietele/e89-c.3.377/_p
Copy
@ARTICLE{e89-c_3_377,
author={Makoto SUGIHARA, Taiga TAKATA, Kenta NAKAMURA, Ryoichi INANAMI, Hiroaki HAYASHI, Katsumi KISHIMOTO, Tetsuya HASEBE, Yukihiro KAWANO, Yusuke MATSUNAGA, Kazuaki MURAKAMI, Katsuya OKUMURA, },
journal={IEICE TRANSACTIONS on Electronics},
title={Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment},
year={2006},
volume={E89-C},
number={3},
pages={377-383},
abstract={We propose a cell library development methodology for throughput enhancement of character projection equipment. First, an ILP (Integer Linear Programming)-based cell selection is proposed for the equipment for which both of the CP (Character Projection) and VSB (Variable Shaped Beam) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed. Finally, a case study is shown in which the numbers of EB shots are shown for several cases.},
keywords={},
doi={10.1093/ietele/e89-c.3.377},
ISSN={1745-1353},
month={March},}
Copy
TY - JOUR
TI - Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment
T2 - IEICE TRANSACTIONS on Electronics
SP - 377
EP - 383
AU - Makoto SUGIHARA
AU - Taiga TAKATA
AU - Kenta NAKAMURA
AU - Ryoichi INANAMI
AU - Hiroaki HAYASHI
AU - Katsumi KISHIMOTO
AU - Tetsuya HASEBE
AU - Yukihiro KAWANO
AU - Yusuke MATSUNAGA
AU - Kazuaki MURAKAMI
AU - Katsuya OKUMURA
PY - 2006
DO - 10.1093/ietele/e89-c.3.377
JO - IEICE TRANSACTIONS on Electronics
SN - 1745-1353
VL - E89-C
IS - 3
JA - IEICE TRANSACTIONS on Electronics
Y1 - March 2006
AB - We propose a cell library development methodology for throughput enhancement of character projection equipment. First, an ILP (Integer Linear Programming)-based cell selection is proposed for the equipment for which both of the CP (Character Projection) and VSB (Variable Shaped Beam) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed. Finally, a case study is shown in which the numbers of EB shots are shown for several cases.
ER -
English
