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IEICE TRANSACTIONS on Electronics

Enabling Light Emission from Si Based MOSLED on Surface Nano-Roughened Si Substrate

Gong-Ru LIN

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Summary :

The historical review of Taiwan's researching activities on the features of PECVD grown SiOx are also included to realize the performance of Si nanocrystal based MOSLED made by such a Si-rich SiOx film with embedded Si nanocrystals on conventional Si substrate. A surface nano-roughened Si substrate with interfacial Si nano-pyramids at SiOx/Si interface are also reviewed, which provide the capabilities of enhancing the surface roughness induced total-internal-reflection relaxation and the Fowler-Nordheim tunneling based carrier injection. These structures enable the light emission and extraction from a metal-SiOx-Si MOSLED.

Publication
IEICE TRANSACTIONS on Electronics Vol.E91-C No.2 pp.173-180
Publication Date
2008/02/01
Publicized
Online ISSN
1745-1353
DOI
10.1093/ietele/e91-c.2.173
Type of Manuscript
Special Section INVITED PAPER (Special Section on Silicon Photonics Technologies and Their Applications)
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