A Novel Electron Beam Resist System Convertible into Silicate Glass
Summary :
A glass precursor resist (GPR) is designed on the basis of an idea of conversion of organosilicon polymer to an inorganic substance by lithographic procedure. Developed chemical amplification resist system is composed of poly (di-t-butoxysiloxane) and a photoacid generator. It has a high sensitivity of 1.6 µC/cm2, a resolution of 0.2 µm and an extremely high O2-RIE durability compared with bottom resist. Exposed film changed into silicate glass, and it was confirmed by IR spectra.
- Publication
- IEICE TRANSACTIONS on Electronics Vol.E76-C No.4 pp.588-593
- Publication Date
- 1993/04/25
- Publicized
- Online ISSN
- DOI
- Type of Manuscript
- Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- Category
- Process Technology
Authors
Keyword
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Toshio ITO, Miwa SAKATA, Maki KOSUGE, "A Novel Electron Beam Resist System Convertible into Silicate Glass" in IEICE TRANSACTIONS on Electronics,
vol. E76-C, no. 4, pp. 588-593, April 1993, doi: .
Abstract: A glass precursor resist (GPR) is designed on the basis of an idea of conversion of organosilicon polymer to an inorganic substance by lithographic procedure. Developed chemical amplification resist system is composed of poly (di-t-butoxysiloxane) and a photoacid generator. It has a high sensitivity of 1.6 µC/cm2, a resolution of 0.2 µm and an extremely high O2-RIE durability compared with bottom resist. Exposed film changed into silicate glass, and it was confirmed by IR spectra.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e76-c_4_588/_p
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@ARTICLE{e76-c_4_588,
author={Toshio ITO, Miwa SAKATA, Maki KOSUGE, },
journal={IEICE TRANSACTIONS on Electronics},
title={A Novel Electron Beam Resist System Convertible into Silicate Glass},
year={1993},
volume={E76-C},
number={4},
pages={588-593},
abstract={A glass precursor resist (GPR) is designed on the basis of an idea of conversion of organosilicon polymer to an inorganic substance by lithographic procedure. Developed chemical amplification resist system is composed of poly (di-t-butoxysiloxane) and a photoacid generator. It has a high sensitivity of 1.6 µC/cm2, a resolution of 0.2 µm and an extremely high O2-RIE durability compared with bottom resist. Exposed film changed into silicate glass, and it was confirmed by IR spectra.},
keywords={},
doi={},
ISSN={},
month={April},}
Copy
TY - JOUR
TI - A Novel Electron Beam Resist System Convertible into Silicate Glass
T2 - IEICE TRANSACTIONS on Electronics
SP - 588
EP - 593
AU - Toshio ITO
AU - Miwa SAKATA
AU - Maki KOSUGE
PY - 1993
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E76-C
IS - 4
JA - IEICE TRANSACTIONS on Electronics
Y1 - April 1993
AB - A glass precursor resist (GPR) is designed on the basis of an idea of conversion of organosilicon polymer to an inorganic substance by lithographic procedure. Developed chemical amplification resist system is composed of poly (di-t-butoxysiloxane) and a photoacid generator. It has a high sensitivity of 1.6 µC/cm2, a resolution of 0.2 µm and an extremely high O2-RIE durability compared with bottom resist. Exposed film changed into silicate glass, and it was confirmed by IR spectra.
ER -
English
